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Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2014-10-24
17:40		 Nagano   Silicidation reaction in Ni/Si system with thin interposed SiO2 layer
Atsushi Noya, Mayumi B. Takeyama (Kitami Inst. Technol.) CPM2014-113		 In the Ni/Si system, we have reported that the composition of an amorphous alloy formed by intermixing between Ni and Si... [more] CPM2014-113
pp.45-48
CPM 2012-10-26
17:30		 Niigata   Formation of multi-phases of monosilicide and disilicide in Ni/Si system
Atsushi Noya, Mayumi Takeyama, Masaru Sato, Susumu Tokuda (Kitami Inst. Technol.) CPM2012-102		 Abstract Silicides nucleation in a Ni/Si system was investigated. In this system, generally, a phase sequence of Ni2Si... [more] CPM2012-102
pp.49-53
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