IEICE Technical Committee Submission System
Conference Schedule
Online Proceedings
[Sign in]
Tech. Rep. Archives
    [Japanese] / [English] 
( Committee/Place/Topics  ) --Press->
 
( Paper Keywords:  /  Column:Title Auth. Affi. Abst. Keyword ) --Press->

All Technical Committee Conferences  (Searched in: All Years)

Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 20 of 26  /  [Next]  
Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2017-07-22
11:33
Hokkaido   [Invited Talk] Development of Low Damage Facing Target Sputter-deposition Processes
Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2017-38
About 43 years ago, I firstly challenged the deposition of YIG films by using a conventional sputtering system. Depositi... [more] CPM2017-38
pp.89-94
HIP 2016-03-18
13:00
Tokyo   Feasible Design and Development of Haptic Display for Finger using MEMS Technology
Takehiro Adachi, Yasuyoshi Matsumoto, Taiki Inomata, Youichi Hoshi, Junji Sone (Tokyo Polytechnic Univ.) HIP2015-96
One is contact force sensation and others are vibration methods in researches of tactile display. Vibration methods are ... [more] HIP2015-96
pp.1-3
CPM 2015-11-06
14:35
Niigata Machinaka Campus Nagaoka Deposition of Top Electrode Films for OLED by Low Damage Sputter-deposition Process
Yoichi Hoshi, Daichi Hamaguchi, Shin-ichi Kobayashi, Takayuki Uchida, Yutaka Sawada (Tokyo Polytechnic Univ.), Hidehiko Shimizu (Niigata Uinv.) CPM2015-87
 [more] CPM2015-87
pp.19-22
HIP 2015-03-02
13:25
Hokkaido   Feasible Design and Development of Tactile Sensation Device for Finger using MEMS Technology (2nd Report)
Takehiro Adachi, Yuki Horikawa, Yoichi Hoshi, Junji Sone (Tokyo Polytechnic Univ.) HIP2014-80
One is contact force sensation and others are vibration methods in researches of tactile display. Vibration methods are ... [more] HIP2014-80
pp.7-10
CPM, ED, SDM 2014-05-28
13:00
Aichi   Evaluation of photocatalytic properties of TiN powders annealed in air
Masaaki Isai, Yoshitaka Yamada (Shizuoka Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) ED2014-20 CPM2014-3 SDM2014-18
TiN powders were annealed in air. The organic decomposition properties of annealed-powders were evaluated by using Methy... [more] ED2014-20 CPM2014-3 SDM2014-18
pp.11-14
CPM 2013-08-01
15:45
Hokkaido   Changes in operating charcteristics of OLED by the deposition of upper electrode films by sputtering
Yoichi Hoshi, Shin-ichi Kobayashi, Takayuki Uchida (Tokyo Polytechnic Univ.), Hidehiko Shimizu (Niigata Univ.) CPM2013-45
In this study, we investigated the affect of the sputter-deposition of upper electrode films on the photo-emission perfo... [more] CPM2013-45
pp.29-34
SDM, ED, CPM 2013-05-17
14:30
Shizuoka Shizuoka Univ. (Hamamatsu) Graduate School of Sci. and Technol. Evaluation of photocatalytic properties of TiO2 films with loading Cu and Fe
Yoshitaka Yamada, Go Atsumi, Ryo Shiraki, Masaaki Isai (Shizuoka Univ.), Yoji Yasuda, Yoichi Hoshi (Tokyo Kougei Univ.) ED2013-32 CPM2013-17 SDM2013-39
It is known that loaded some metals on the TiO2 surface facilitate their organic decomposition properties. In this study... [more] ED2013-32 CPM2013-17 SDM2013-39
pp.87-92
ED, SDM, CPM 2012-05-18
15:15
Aichi VBL, Toyohashi Univ. of Technol. Co-catalyitic effect on improving the photocatalytic properties of TiO2 films
Masaaki Isai, Ikuta Nakamura, Yuuki Hieda, Fumiya Fukazawa (Shizuoka Univ.), Yoichi Hoshi (Tokyo Polytech.Univ.) ED2012-38 CPM2012-22 SDM2012-40
Abstract TiO2 films were prepared with RF magnetron sputtering method. The copper (cu) and iron (Fe) films were deposit... [more] ED2012-38 CPM2012-22 SDM2012-40
pp.105-109
CPM, SDM, ED 2011-05-20
13:50
Aichi Nagoya Univ. (VBL) Stabilized Pt deposition on the TiO2 films and their photocatalytic properties
Ikuta Nakamura, Takanori Sato, Masaaki Isai (Shizuoka Univ.), Yoichi Hoshi (Tokyo polytech.Univ.) ED2011-28 CPM2011-35 SDM2011-41
TiO2 films were prepared with RF magnetron sputtering method. The platinum (Pt) films were deposited on the TiO2 films. ... [more] ED2011-28 CPM2011-35 SDM2011-41
pp.139-143
CPM 2010-10-29
11:50
Nagano   Examination of ITO Thin Films Deposited at Low-tempurature for OLEDs by Sputtering Method
Yohei Nakamura, Chang Liu, Hidehiko Shimizu, Haruo Iwano, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2010-105
In order to examine problems of the ITO films deposited at the low-temperature, the ITO films was deposited at the low-t... [more] CPM2010-105
pp.71-75
CPM 2010-07-29
14:20
Hokkaido Michino-Eki Shari Meeting Room Characteristic of AZO thin films deposited at room temperature by sputtering method
Hidehiko Shimizu, Jun Kashiide, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2010-32
 [more] CPM2010-32
pp.5-9
SDM, CPM, ED 2010-05-14
11:30
Shizuoka Shizuoka University (Hamamatsu Campus) Preparation of Pt-deposited TiO2 films and evaluation of photocatalystic properties
Ikuta Nakamura, Tatsuya Ito, Masaaki Isai (Shizuoka Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) ED2010-28 CPM2010-18 SDM2010-28
This research was designed for planning a progress of photocatalystic properties of TiO2 thin films with depositing Pt p... [more] ED2010-28 CPM2010-18 SDM2010-28
pp.61-64
ED, CPM, SDM 2009-05-14
15:25
Aichi Satellite Office, Toyohashi Univ. of Technology Preparation of TiO2 thin films by RF magnetron sputtering method and their photocatalytic properties
Tatsuya Ito, Tatsuya Endo, Masaaki Isai (Shizuoka Univ.), Tetsuya Sakai, Yoichi Hoshi (Tokyo Polytech. Univ.) ED2009-22 CPM2009-12 SDM2009-12
Low-temperature preparation of the TiO2 thin films was examined by using a RF magnetron sputtering method was examined. ... [more] ED2009-22 CPM2009-12 SDM2009-12
pp.21-24
CPM 2008-10-30
14:55
Niigata Niigata Univ. Characteristic of AZO Thin Films Deposited by SBD Method
Takuya Honma, Kaoru Satou, Takeharu Shimomura, Rijin Syou, Hidehiko Shimizu, Haruo Iwano (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnio Univ.) CPM2008-79
In order to clarify a problem in sputtering deposition process when zinc oxide films of transparent conductive oxides we... [more] CPM2008-79
pp.23-28
CPM 2008-10-31
09:50
Niigata Niigata Univ. Examination of Ar ion bombardment effect to ITO Thin Films
Saki Takahashi, Masato Niki, Youhei Nakamura, Hidehiko Shimizu, Haruo Iwano, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnio Univ.) CPM2008-84
In order to examine deposition method to crystallize an ITO film at low temperature, deposition of ITO thin films was at... [more] CPM2008-84
pp.53-58
CPM 2008-10-31
11:45
Niigata Niigata Univ. Structure and photocatalytic properties of TiO2 films depopsited by high rate reactive sputtering.
Yoichi Hoshi, Taiki Ishihara, Tetsuya Sakai, Hao Lei (Tokyo Polytechnio Univ.), Hidehiko Shimizu (Niigata Univ.) CPM2008-88
We reported that reactive sputtering by using two sputtering sources, one for the supply of Ti atoms and another for the... [more] CPM2008-88
pp.75-79
CPM 2007-11-16
13:45
Niigata Nagaoka University of Technology Examination of OLEDs device Applied ITO Thin Films Deposited at Low Temperature
Yusuke Nakata, Shinsuke Miyazaki, Takeshi Umetsu, Yoshihiro Itou, Masato Niki, Hidehiko Shimizu, Takeo Maruyama (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.), Masahiro Minagawa (Nippon Seiki)
 [more]
CPM 2007-11-16
15:10
Niigata Nagaoka University of Technology HIgh rate reactive sputter-deposition of TiO2 films by using two sputtering sources
Tetsuya Sakai, Osamu Kamiya, Yoichi Hoshi (Tokyo Polytechnic Univ.), Hidehiko Shimizu (Niigata Univ.) CPM2007-109
 [more] CPM2007-109
pp.23-27
CPM 2007-08-09
16:10
Yamagata Yamagata Univ. Examination of ITO Thin Films Deposited by Substrate Bias Sputtering(II)
Takeshi Umetsu, Yusuke Nakata, Hidehiko Shimizu, Takeo Maruyama, Haruo Iwano (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2007-42
In order to examine deposition method to crystallize an ITO film at low temperature, deposition of ITO thin films was at... [more] CPM2007-42
pp.33-38
CPM 2006-11-09
13:30
Ishikawa Kanazawa Univ. Prepration of AZO thin films by sputtering method
Ayumu Kawakami, Toru Noguchi, Akiyuki Higashide, Shinsuke Miyazaki, Hidehiko Shimizu, Takeo Maruyama, Haruo Iwano, Takahiro Kawakami (Niigata Univ.), Yoichi Hoshi (T.P.U.)
 [more] CPM2006-113
pp.1-5
 Results 1 - 20 of 26  /  [Next]  
Choose a download format for default settings. [NEW !!]
Text format pLaTeX format CSV format BibTeX format
Copyright and reproduction : All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan