Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
CPM |
2017-07-22 11:33 |
Hokkaido |
|
[Invited Talk]
Development of Low Damage Facing Target Sputter-deposition Processes Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2017-38 |
About 43 years ago, I firstly challenged the deposition of YIG films by using a conventional sputtering system. Depositi... [more] |
CPM2017-38 pp.89-94 |
HIP |
2016-03-18 13:00 |
Tokyo |
|
Feasible Design and Development of Haptic Display for Finger using MEMS Technology Takehiro Adachi, Yasuyoshi Matsumoto, Taiki Inomata, Youichi Hoshi, Junji Sone (Tokyo Polytechnic Univ.) HIP2015-96 |
One is contact force sensation and others are vibration methods in researches of tactile display. Vibration methods are ... [more] |
HIP2015-96 pp.1-3 |
CPM |
2015-11-06 14:35 |
Niigata |
Machinaka Campus Nagaoka |
Deposition of Top Electrode Films for OLED by Low Damage Sputter-deposition Process Yoichi Hoshi, Daichi Hamaguchi, Shin-ichi Kobayashi, Takayuki Uchida, Yutaka Sawada (Tokyo Polytechnic Univ.), Hidehiko Shimizu (Niigata Uinv.) CPM2015-87 |
[more] |
CPM2015-87 pp.19-22 |
HIP |
2015-03-02 13:25 |
Hokkaido |
|
Feasible Design and Development of Tactile Sensation Device for Finger using MEMS Technology (2nd Report) Takehiro Adachi, Yuki Horikawa, Yoichi Hoshi, Junji Sone (Tokyo Polytechnic Univ.) HIP2014-80 |
One is contact force sensation and others are vibration methods in researches of tactile display. Vibration methods are ... [more] |
HIP2014-80 pp.7-10 |
CPM, ED, SDM |
2014-05-28 13:00 |
Aichi |
|
Evaluation of photocatalytic properties of TiN powders annealed in air Masaaki Isai, Yoshitaka Yamada (Shizuoka Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) ED2014-20 CPM2014-3 SDM2014-18 |
TiN powders were annealed in air. The organic decomposition properties of annealed-powders were evaluated by using Methy... [more] |
ED2014-20 CPM2014-3 SDM2014-18 pp.11-14 |
CPM |
2013-08-01 15:45 |
Hokkaido |
|
Changes in operating charcteristics of OLED by the deposition of upper electrode films by sputtering Yoichi Hoshi, Shin-ichi Kobayashi, Takayuki Uchida (Tokyo Polytechnic Univ.), Hidehiko Shimizu (Niigata Univ.) CPM2013-45 |
In this study, we investigated the affect of the sputter-deposition of upper electrode films on the photo-emission perfo... [more] |
CPM2013-45 pp.29-34 |
SDM, ED, CPM |
2013-05-17 14:30 |
Shizuoka |
Shizuoka Univ. (Hamamatsu) Graduate School of Sci. and Technol. |
Evaluation of photocatalytic properties of TiO2 films with loading Cu and Fe Yoshitaka Yamada, Go Atsumi, Ryo Shiraki, Masaaki Isai (Shizuoka Univ.), Yoji Yasuda, Yoichi Hoshi (Tokyo Kougei Univ.) ED2013-32 CPM2013-17 SDM2013-39 |
It is known that loaded some metals on the TiO2 surface facilitate their organic decomposition properties. In this study... [more] |
ED2013-32 CPM2013-17 SDM2013-39 pp.87-92 |
ED, SDM, CPM |
2012-05-18 15:15 |
Aichi |
VBL, Toyohashi Univ. of Technol. |
Co-catalyitic effect on improving the photocatalytic properties of TiO2 films Masaaki Isai, Ikuta Nakamura, Yuuki Hieda, Fumiya Fukazawa (Shizuoka Univ.), Yoichi Hoshi (Tokyo Polytech.Univ.) ED2012-38 CPM2012-22 SDM2012-40 |
Abstract TiO2 films were prepared with RF magnetron sputtering method. The copper (cu) and iron (Fe) films were deposit... [more] |
ED2012-38 CPM2012-22 SDM2012-40 pp.105-109 |
CPM, SDM, ED |
2011-05-20 13:50 |
Aichi |
Nagoya Univ. (VBL) |
Stabilized Pt deposition on the TiO2 films and their photocatalytic properties Ikuta Nakamura, Takanori Sato, Masaaki Isai (Shizuoka Univ.), Yoichi Hoshi (Tokyo polytech.Univ.) ED2011-28 CPM2011-35 SDM2011-41 |
TiO2 films were prepared with RF magnetron sputtering method. The platinum (Pt) films were deposited on the TiO2 films. ... [more] |
ED2011-28 CPM2011-35 SDM2011-41 pp.139-143 |
CPM |
2010-10-29 11:50 |
Nagano |
|
Examination of ITO Thin Films Deposited at Low-tempurature for OLEDs by Sputtering Method Yohei Nakamura, Chang Liu, Hidehiko Shimizu, Haruo Iwano, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2010-105 |
In order to examine problems of the ITO films deposited at the low-temperature, the ITO films was deposited at the low-t... [more] |
CPM2010-105 pp.71-75 |
CPM |
2010-07-29 14:20 |
Hokkaido |
Michino-Eki Shari Meeting Room |
Characteristic of AZO thin films deposited at room temperature by sputtering method Hidehiko Shimizu, Jun Kashiide, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2010-32 |
[more] |
CPM2010-32 pp.5-9 |
SDM, CPM, ED |
2010-05-14 11:30 |
Shizuoka |
Shizuoka University (Hamamatsu Campus) |
Preparation of Pt-deposited TiO2 films and evaluation of photocatalystic properties Ikuta Nakamura, Tatsuya Ito, Masaaki Isai (Shizuoka Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) ED2010-28 CPM2010-18 SDM2010-28 |
This research was designed for planning a progress of photocatalystic properties of TiO2 thin films with depositing Pt p... [more] |
ED2010-28 CPM2010-18 SDM2010-28 pp.61-64 |
ED, CPM, SDM |
2009-05-14 15:25 |
Aichi |
Satellite Office, Toyohashi Univ. of Technology |
Preparation of TiO2 thin films by RF magnetron sputtering method and their photocatalytic properties Tatsuya Ito, Tatsuya Endo, Masaaki Isai (Shizuoka Univ.), Tetsuya Sakai, Yoichi Hoshi (Tokyo Polytech. Univ.) ED2009-22 CPM2009-12 SDM2009-12 |
Low-temperature preparation of the TiO2 thin films was examined by using a RF magnetron sputtering method was examined. ... [more] |
ED2009-22 CPM2009-12 SDM2009-12 pp.21-24 |
CPM |
2008-10-30 14:55 |
Niigata |
Niigata Univ. |
Characteristic of AZO Thin Films Deposited by SBD Method Takuya Honma, Kaoru Satou, Takeharu Shimomura, Rijin Syou, Hidehiko Shimizu, Haruo Iwano (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnio Univ.) CPM2008-79 |
In order to clarify a problem in sputtering deposition process when zinc oxide films of transparent conductive oxides we... [more] |
CPM2008-79 pp.23-28 |
CPM |
2008-10-31 09:50 |
Niigata |
Niigata Univ. |
Examination of Ar ion bombardment effect to ITO Thin Films Saki Takahashi, Masato Niki, Youhei Nakamura, Hidehiko Shimizu, Haruo Iwano, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnio Univ.) CPM2008-84 |
In order to examine deposition method to crystallize an ITO film at low temperature, deposition of ITO thin films was at... [more] |
CPM2008-84 pp.53-58 |
CPM |
2008-10-31 11:45 |
Niigata |
Niigata Univ. |
Structure and photocatalytic properties of TiO2 films depopsited by high rate reactive sputtering. Yoichi Hoshi, Taiki Ishihara, Tetsuya Sakai, Hao Lei (Tokyo Polytechnio Univ.), Hidehiko Shimizu (Niigata Univ.) CPM2008-88 |
We reported that reactive sputtering by using two sputtering sources, one for the supply of Ti atoms and another for the... [more] |
CPM2008-88 pp.75-79 |
CPM |
2007-11-16 13:45 |
Niigata |
Nagaoka University of Technology |
Examination of OLEDs device Applied ITO Thin Films Deposited at Low Temperature Yusuke Nakata, Shinsuke Miyazaki, Takeshi Umetsu, Yoshihiro Itou, Masato Niki, Hidehiko Shimizu, Takeo Maruyama (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.), Masahiro Minagawa (Nippon Seiki) |
[more] |
|
CPM |
2007-11-16 15:10 |
Niigata |
Nagaoka University of Technology |
HIgh rate reactive sputter-deposition of TiO2 films by using two sputtering sources Tetsuya Sakai, Osamu Kamiya, Yoichi Hoshi (Tokyo Polytechnic Univ.), Hidehiko Shimizu (Niigata Univ.) CPM2007-109 |
[more] |
CPM2007-109 pp.23-27 |
CPM |
2007-08-09 16:10 |
Yamagata |
Yamagata Univ. |
Examination of ITO Thin Films Deposited by Substrate Bias Sputtering(II) Takeshi Umetsu, Yusuke Nakata, Hidehiko Shimizu, Takeo Maruyama, Haruo Iwano (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2007-42 |
In order to examine deposition method to crystallize an ITO film at low temperature, deposition of ITO thin films was at... [more] |
CPM2007-42 pp.33-38 |
CPM |
2006-11-09 13:30 |
Ishikawa |
Kanazawa Univ. |
Prepration of AZO thin films by sputtering method Ayumu Kawakami, Toru Noguchi, Akiyuki Higashide, Shinsuke Miyazaki, Hidehiko Shimizu, Takeo Maruyama, Haruo Iwano, Takahiro Kawakami (Niigata Univ.), Yoichi Hoshi (T.P.U.) |
[more] |
CPM2006-113 pp.1-5 |