IEICE Technical Committee Submission System
Conference Schedule		 Online Proceedings
[Sign in]
Tech. Rep. Archives
    [Japanese] / [English] 
( Committee/Place/Topics  ) --Press->
 
( Paper Keywords:  /  Column:Title Auth. Affi. Abst. Keyword ) --Press->

All Technical Committee Conferences  (Searched in: All Years)

Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 3 of 3  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2016-11-10
11:00		 Tokyo Kikai-Shinko-Kaikan Bldg. [Invited Talk] Channel Properties of SiC Trench-Etched Double-Implanted MOS (TED MOS)
Naoki Tega, Digh Hisamoto, Akio Shima, Yasuhiro Shimamoto (Hitachi) SDM2016-80		 We comprehensively studied the channel properties of a silicon carbide trench-etched double-implanted MOS (SiC TED MOS).... [more] SDM2016-80
pp.9-14
SDM 2006-06-21
15:20		 Hiroshima Faculty Club, Hiroshima Univ. Work-function engineering of poly-Si gate by Fermi level pinning and its impact on low power CMOSFET
Yasuhiro Shimamoto (Hitachi), Jiro Yugami, Masao Inoue, Masaharu Mizutani, Takashi Hayashi, Masahiro Yoneda (Renesas) 		 [more] SDM2006-47
pp.31-35
ICD, SDM 2005-08-19
11:35		 Hokkaido HAKODATE KOKUSAI HOTEL Gate work-function modulation in SiON/poly-Si gate stacks, and its impact on low power devices -- Advantage of sub-monolayer Hf at SiON/poly-Si interface --
Jiro Yugami (Renesas), Yasuhiro Shimamoto (Hitachi), Masao Inoue, Masaharu Mizutani, Takashi Hayashi, Katsuya Shiga, Fumiko Fujita, Jyunichi Tuchimoto, Yoshikazu Ohno, Masahiro Yoneda (Renesas) 		Gate work-function (WF) is controlled by incorporating sub-monolayer Hf at SiON/poly-Si interface. This technique provid... [more] SDM2005-149 ICD2005-88
pp.37-42
 Results 1 - 3 of 3  /   
Choose a download format for default settings. [NEW !!]
Text format pLaTeX format CSV format BibTeX format
Copyright and reproduction : All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)

[Return to Top Page]

[Return to IEICE Web Page]
The Institute of Electronics, Information and Communication Engineers (IEICE), Japan