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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
WPT, AP (Joint) |
2019-01-17 13:35 |
Aichi |
Toyota Automobile Museum |
[Invited Lecture]
Near-field Wireless Power Transfer for Small Model Vehicle using Collinear Array Antenna Jun Deguchi, Kazuhiro Yoshikawa, Hiroshi Hirayama (Nagoya Inst. of Tech.) WPT2018-55 |
[more] |
WPT2018-55 pp.7-12 |
SANE |
2013-06-21 16:25 |
Ibaraki |
Tsukuba Space Center, JAXA |
PPP experiments via QZSS-LEX Kazuhiro Yoshikawa, Kaori Kawate, Motoyuki Miyoshi, Satoshi Kogure (JAXA), Tatsinori Sada (NU), Tomoji Takasu (Tokyo Univ. of Marine Science and Tech.), Yasutaka Hirahara (NEC) SANE2013-33 |
QZS-1 “MICHIBIKI” was launched in September 11th 2010 by H-IIA launch vehicle Flight 18th, and verification of QZSS (Qua... [more] |
SANE2013-33 pp.103-108 |
SDM |
2012-10-26 13:50 |
Miyagi |
Tohoku Univ. (Niche) |
Ultra high speed wet etching technology for a silicon wafer process Takeshi Sakai, Tatsuro Yoshida, Kazuhiro Yoshikawa, Tadahiro Ohmi (Tohoku Univ.) SDM2012-97 |
The silicon wafer thinning technology is important in three-dimensional integrated technology. In this paper, we conside... [more] |
SDM2012-97 pp.41-45 |
SDM |
2011-10-21 16:15 |
Miyagi |
Tohoku Univ. (Niche) |
Silicon Wafer Wet Etching for Plug Protrusion of 3D chip-stacking technology with Through Silicon Via Kazuhiro Yoshikawa (PretechAT), Tatsuro Yoshida, Kazuki Soeda, Ryousuke Hiratuka, Tadahiro Ohmi (Tohoku Univ.) SDM2011-114 |
[more] |
SDM2011-114 pp.97-100 |
SDM |
2009-10-29 15:30 |
Miyagi |
Tohoku University |
Silicon Wafer Thinning Technology for Three-Dimensional Integrated Circuit by Wet Etching Kazuhiro Yoshikawa, Tomotsugu Ohashi, Tatsuro Yoshida, Takenao Nemoto, Tadahiro Ohmi (Tohoku Univ.) SDM2009-120 |
A three-dimensional integrated circuit is developed as an emerging technology in a semiconductor industry. The silicon w... [more] |
SDM2009-120 pp.15-19 |
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