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Committee Date Time Place Paper Title / Authors Abstract Paper #
OPE, EMT, LQE, PN 2007-01-29
10:45		 Osaka Osaka Univ. Convention Center Three-dimensional fabrication of photoresist using holographic two-photon microfabrication
Hidetomo Takahashi, Maki Nishitani, Yoshio Hayasaki (Tokushima Univ.) PN2006-50 OPE2006-132 LQE2006-121		 Holographic two-photon microfabrication method performs high-speed parallel processing inside photoresist using a comput... [more] PN2006-50 OPE2006-132 LQE2006-121
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