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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
SDM |
2024-01-31 13:05 |
Tokyo |
KIT Toranomon Graduate School (Primary: On-site, Secondary: Online) |
[Invited Talk]
Polarization Engineering in AlSiO/p-type GaN MOSFETs Using AlN Interlayers Formed by Plasma-Enhanced Atomic Layer Deposition Kenji Ito, Tetsuo Narita, Hiroko Iguchi, Shiro Iwasaki, Daigo Kikuta (Toyota Central R&D), Emi Kano, Nobuyuki Ikarashi, Kazuyoshi Tomita, Masahiro Horita, Jun Suda (Nagoya Univ.) SDM2023-75 |
Polarization engineering by AlN interlayers (AlN-ILs) deposited via plasma-enhanced atomic layer deposition was demonstr... [more] |
SDM2023-75 pp.5-8 |
SDM, ED, CPM |
2017-05-26 10:20 |
Aichi |
VBL, Nagoya University |
Characterization of GaN epilayers grown on GaN substrates by a microwave photoconductivity decay method Takato Asada (N.I.Tech), Yoshihito Ichikawa (NITech), Kenji Ito, Kazuyoshi Tomita, Tetsuo Narita (Toyota Central R&D Labs.), Tetsu Kachi (Nagoya Univ.), Masashi Kato (NITech) ED2017-25 CPM2017-11 SDM2017-19 |
[more] |
ED2017-25 CPM2017-11 SDM2017-19 pp.55-58 |
ED, LQE, CPM |
2015-11-26 13:35 |
Osaka |
Osaka City University Media Center |
Electrical characterization of lightly Si-doped homoepitaxitial n-type GaN studied by Hall-effect measurement Naoki Sawada (Kyoto Univ.), Tetsuo Narita, Tetsu Kachi, Tsutomu Uesugi (TOYOTA Central R&D Labs.), Masahiro Horita, Jun Suda (Kyoto Univ.) ED2015-73 CPM2015-108 LQE2015-105 |
[more] |
ED2015-73 CPM2015-108 LQE2015-105 pp.27-32 |
CPM, LQE, ED |
2010-11-12 10:25 |
Osaka |
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Study of etching-induced damage in p-type GaN by hard X-ray photoelectron spectroscopy Daigo Kikuta, Tetsuo Narita, Naoko Takahashi, Keita Kataoka, Yasuji Kimoto, Tsutomu Uesugi, Tetsu Kachi (Toyota CRDL, Inc.), Masahiro Sugimoto (Toyota Motor Corp.) ED2010-155 CPM2010-121 LQE2010-111 |
We carried out nondestructive measurements of the depth profile of etching-induced damage in p-GaN, in particular surfac... [more] |
ED2010-155 CPM2010-121 LQE2010-111 pp.59-62 |
ED, CPM, LQE |
2006-10-06 11:50 |
Kyoto |
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Analysis of internal quantum efficiency of GaN-based light emitting diodes by investigating electroluminescence lifetime Kotaro Zaima (Toshiba), Tetsuo Narita (Nagoya Univ.), Shinji Saito, Koichi Tachibana, Hajime Nago, Genichi Hatakoshi, Shinya Nunoue (Toshiba) |
The internal quantum efficiency of GaN-based light emitting diodes (LEDs) was analyzed by investigating electroluminesce... [more] |
ED2006-166 CPM2006-103 LQE2006-70 pp.79-82 |
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