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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
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Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM 2016-06-29
14:45		 Tokyo Campus Innovation Center Tokyo Low Temperature Formation of Thin SiO2 Film by Using Remote Oxygen Plasma Enhanced CVD
NguyenXuan Truyen, Nobuyuki Fujimura, Daichi Takeuchi, Akio Ohta, Katsunori Makihara, Mitsuhisa Ikeda, Seiichi Miyazaki (Nagoya Univ.) SDM2016-41		 SiO2 thin films have been deposited on H-terminated Si surface by remote O2 plasma enhanced CVD (O2-RPCVD) using SiH4 an... [more] SDM2016-41
pp.49-52
SDM 2014-06-19
15:20		 Aichi VBL, Nagoya Univ. [Invited Lecture] Local Characterization of Resistive Switching Properties of Si-rich Oxide Thin Films by Using Ni Nanodot Electrode
Akio Ohta, Chong Liu, Takashi Arai, Daichi Takeuchi, Hai Zhang, Katsunori Makihara, Seiichi Miyazaki (Nagoya Univ.) SDM2014-56		  [more] SDM2014-56
pp.69-73
SDM, ED
(Workshop)		 2012-06-28
09:30		 Okinawa Okinawa Seinen-kaikan Characterization of Local Electronic Transport through Ultrathin Au/Highly-dense Si Nanocolumar structures by Conducting-Probe Atomic Force Microscopy
Daichi Takeuchi, Katsunori Makihara (Nagoya Univ.), Mitsuhisa Ikeda (Hiroshima Univ.), Seiichi Miyazaki (Nagoya Univ.), Hirokazu Kaki, Tsukasa Hayashi (NISSIN ELECTRIC Co. Ltd.,) 		 [more]
ED, SDM, CPM 2012-05-18
14:15		 Aichi VBL, Toyohashi Univ. of Technol. Characterization of Local Electronic Transport and Electronic Emission Properties of Pillar-Shaped Si Nanostructures
Daichi Takeuchi, Katsunori Makihara (Nagoya Univ.), Mitsuhisa Ikeda (Hiroshima Univ.), Seiichi Miyazaki (Nagoya Univ.), Hirokazu Kaki, Tsukasa Hayashi (NISSIN ELECTRIC Co. Ltd.) ED2012-36 CPM2012-20 SDM2012-38		  [more] ED2012-36 CPM2012-20 SDM2012-38
pp.95-98
 Results 1 - 4 of 4  /   
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