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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
CPM |
2020-10-29 14:00 |
Online |
Online |
Mechanism of Cu(111) orientation control on extremely thin barrier Mayumi B. Takeyama (Kitami Inst.& Technol.), Mitsunobu Yasuda (Toray Research Center.), Masaru Sato (Kitami Inst.& Technol.) CPM2020-14 |
In Si-LSI and/or 3D-LSI technology, it is strongly desired to obtain Cu(111) orientation with excellent electromigration... [more] |
CPM2020-14 pp.11-14 |
SDM |
2014-02-28 11:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Impact of Back Grind Damage on Si Wafer Thinning for 3D Integration Yoriko Mizushima (Fujitsu Lab./Tokyo Inst. of Tech.), Youngsuk Kim (Tokyo Inst. of Tech./Disco), Tomoji Nakamura (Fujitsu Lab.), Ryuichi Sugie, Hideki Hashimoto (Toray Research Center), Akira Uedono (Univ. of Tsukuba), Takayuki Ohba (Tokyo Inst. of Tech.) SDM2013-167 |
Ultra-thin wafer is indispensable for bumpless 3D stacking. To know the thinning damage in detail, an atomic level defec... [more] |
SDM2013-167 pp.13-18 |
R |
2009-06-19 13:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Observations and analyses on device structures for reliability of IC/LSI Tsuneo Ajioka, Sumihisa Ishikawa, Keiichi Yamada (Toray Reaserch Center) R2009-17 |
[more] |
R2009-17 pp.1-6 |
ED |
2008-10-23 13:00 |
Fukuoka |
Kyushu Institute of Technology |
Crystalline Recovery and Point Defects Re-arrangement during Activation Annealing of Implanted SiC Crystal Ryo Hattori, Tomokatsu Watanabe, Hiroaki Sumitani, Tatsuo Oomori (Mitsubishi Electric Corp.), Takeshi Mitani (TRC) ED2008-146 |
[more] |
ED2008-146 pp.127-132 |
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