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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 7 of 7  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
MW, ICD 2019-03-14
11:20
Okinawa   High power microwave impedance real-time measurement system
Asako Suzuki (Adamant Namiki), Kaiji Nakahara, Motoaki Miyazaki, Naoki Ejima, Naoki Sakai, Satoshi Tsukamoto, Takashi Ohira (Toyohashi Univ. Tech.) MW2018-159 ICD2018-103
We propose a compact RF high power real-time reflection coefficient measurement system. This system consists of four par... [more] MW2018-159 ICD2018-103
pp.19-22
MW, ICD 2019-03-14
14:50
Okinawa   A tunable impedance transformer that draws a spiral locus on the Smith chart by frequency sweep
Asako Suzuki (Adamant Namiki), Motoaki Miyazaki, Naoki Sakai (Toyohashi Univ. Tech.), Toshio Ishizaki (Ryukoku Univ.), Satoshi Tsukamoto, Takashi Ohira (Toyohashi Univ. Tech.) MW2018-164 ICD2018-108
We propose a tunable impedance transformer that draws a spiral locus on the Smith chart by frequency sweep and an automa... [more] MW2018-164 ICD2018-108
pp.43-48
OME 2019-02-27
14:10
Tokyo Tokyo University of Agriculture and Technology (Koganei Campus) Temperature insensitive in-line connection using plastic optical fibers for automotive optical communications
Masahiro Uchida (Utsunomiya Univ.), Koji Horiguchi, Tomohiro Kikuta (ADAMANT Namiki), Shigeru Kobayashi, Okihiro Sugihara (Utsunomiya Univ.) OME2018-56
For automotive optical communication system using plastic optical fibers whose loss increased when the temperature becam... [more] OME2018-56
pp.13-16
CPM 2018-08-10
11:25
Aomori Hirosaki Univ. Surface composition and chemical bond structure of Zr-based metallic glass
Haruto Koriyama, Keisuke Fujimori, Yoshiharu Enta (Hirosaki Univ.), Nozomu Togashi (Adamant Namiki Precision Jewel) CPM2018-19
It has been reported that the Zr-based bulk metallic glass alloy commonly known as Vit 105 (Zr_{52.5}Cu_{17.9}Ni_{14.6}A... [more] CPM2018-19
pp.53-56
OME 2017-12-01
09:20
Saga Sun Messe Tosu High efficiency processing and its processing mechanism of large area diamond substrate due to plasma fusion CMP
Hidetoshi Takeda (Namiki Precision Jewel Co., Ltd.), Toshiro Doi (Kyushu Univ.), Seong Woo Kim (Namiki Precision Jewel Co., Ltd.), Hideo Aida (Nagaoka Univ. Tech.), Masaharu Shiratani (Kyushu Univ.) OME2017-35
SiC, GaN and Diamond are known as next generation semiconductor materials, but on the other hand, these are known as ult... [more] OME2017-35
pp.1-6
OME, SDM 2017-04-21
10:00
Kagoshima Tatsugochou Shougaigakushuu Center Plasma fusion CMP® technology for GaN substrates -- Evaluation of processing characteristics for plasma fusion CMP® using Ar plasma and ethanol bubbling --
Naoki Yamazaki (Kyushu Univ./Namiki PrecisionJewel Co.,LTD), Toshiro Doi (Kyushu Univ), Hideo Aida (Kyushu Univ./Namiki PrecisionJewel Co.,LTD), Seongwoo Kim, Koki Oyama (Namiki PrecisionJewel Co.,LTD), Shuhei Kurokawa (Kyushu Univ), Yasuhisa Sano (Osaka Univ.), Masaharu Shiratani, Yoko Yamanishi (Kyushu Univ) SDM2017-5 OME2017-5
 [more] SDM2017-5 OME2017-5
pp.19-23
CPM, LQE, ED 2013-11-28
11:50
Osaka   Bow management of substrate for nitride semiconductor devices by internally focused laser processing -- application to silicon substrate --
Natsuko Aota, Hideo Aida, Hidetoshi Takeda (Namiki Precision Jewel) ED2013-67 CPM2013-126 LQE2013-102
Bow management for heteroepitaxy of III-Nitride films on silicon substrate has been required, as substrate bow is introd... [more] ED2013-67 CPM2013-126 LQE2013-102
pp.17-20
 Results 1 - 7 of 7  /   
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