Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
ISEC, IT, WBS |
2020-03-10 11:55 |
Hyogo |
University of Hyogo (Cancelled but technical report was issued) |
An Improved Learning Method for Weighted-BP using MAP-based Training Data Filtering Ryota Yoshizawa, Kenichiro Furuta, Yuma Yoshinaga, Osamu Torii, Tomoya Kodama (Kioxia) IT2019-101 ISEC2019-97 WBS2019-50 |
Weighted-BP has been proposed so as to compensate the shortcoming of BP decoding of high-density parity-check (HDPC) cod... [more] |
IT2019-101 ISEC2019-97 WBS2019-50 pp.73-78 |
HWS, VLD [detail] |
2020-03-04 16:00 |
Okinawa |
Okinawa Ken Seinen Kaikan (Cancelled but technical report was issued) |
Pixel-based Mask Optimization with Lagrangian Relaxation and Boundary Flipping Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2019-105 HWS2019-78 |
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] |
VLD2019-105 HWS2019-78 pp.65-70 |
SDM |
2020-01-28 13:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Formation of High Reliability Hydrogen-free MONOS Cells Using Deuterated Ammonia Masaki Noguchi, Tatsunori Isogai, Hiroyuki Yamashita, Keiichi Sawa, Ryota Fujitsuka, Takanori Yamanaka, Shunsuke Okada, Tomonori Aoyama, Fumiki Aiso, Junko Abe, Yoshiro Ogawa, Seiji Nakagawa, Hideshi Miyajima (KIOXIA) SDM2019-82 |
For high reliability non-volatile memory cell dielectrics, hydrogen-free deuterated tunnel SiON and charge-trap SiN film... [more] |
SDM2019-82 pp.1-4 |
SDM |
2020-01-28 14:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Performance Maximization of In-Memory Reinforcement Learning with Variability-Controlled Hf1-xZrxO2 Ferroelectric Tunnel Junctions Kensuke Ota, Marina Yamaguchi (kioxia), Radu Berdan, Takao Marukame, Yoshifumi Nishi (Toshiba), Kazuhiro Matsuo, Kota Takahashi, Yuta Kamiya, Shinji Miyano, Jun Deguchi, Shosuke Fujii, Masumi Saitoh (kioxia) SDM2019-84 |
We develop strategies to maximize the performance and reliability of in-memory reinforcement learning with Hf1-xZrxO2 fe... [more] |
SDM2019-84 p.9 |
SDM |
2020-01-28 14:45 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Can in-memory/Analog Accelerators be a Silver Bullet for Energy-efficient Inference? Jun Deguchi, Daisuke Miyashita, Asuka Maki, Shinichi Sasaki, Kengo Nakata, Fumihiko Tachibana, Ryuichi Fujimoto (KIOXIA) SDM2019-85 |
This presentation introduces and discuss recent trends on in-memory/analog computing for deep learning inference, which ... [more] |
SDM2019-85 p.11 |
SDM |
2020-01-28 15:15 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
3D Semicircular Flash Memory Cell: Novel Split-Gate Technology to Boost Bit Density Tetsu Morooka (kioxia) SDM2019-86 |
[more] |
SDM2019-86 pp.13-18 |
SDM |
2020-01-28 15:45 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
[Invited Talk]
Future of Non-Volatile Memory - From Storage to Computing Kazunari Ishimaru (kioxia) SDM2019-87 |
More than thirty years passed since the first NAND flash memory was presented at the IEDM. The NAND flash memory expande... [more] |
SDM2019-87 p.19 |
VLD, DC, CPSY, RECONF, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2019-11-15 10:45 |
Ehime |
Ehime Prefecture Gender Equality Center |
[Keynote Address]
Co-optimization of hardware architecture and algorithm for energy-efficient CNN inference Daisuke Miyashita (Kioxia) VLD2019-47 ICD2019-36 IE2019-42 CPSY2019-46 DC2019-71 RECONF2019-42 |
(To be available after the conference date) [more] |
VLD2019-47 ICD2019-36 IE2019-42 CPSY2019-46 DC2019-71 RECONF2019-42 p.173(VLD), p.41(ICD), p.41(IE), p.53(CPSY), p.173(DC), p.31(RECONF) |
VLD, DC, CPSY, RECONF, ICD, IE, IPSJ-SLDM, IPSJ-EMB, IPSJ-ARC (Joint) [detail] |
2019-11-15 16:35 |
Ehime |
Ehime Prefecture Gender Equality Center |
Mask Optimization Considering Process Variation by Subgradient Method Yukihide Kohira, Rina Azuma (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2019-53 DC2019-77 |
Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In r... [more] |
VLD2019-53 DC2019-77 pp.197-202 |