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 Conference Papers (Available on Advance Programs)  (Sort by: Date Descending)
 Results 1 - 9 of 9  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
IMQ, IE, MVE, CQ
(Joint) [detail]
2023-03-17
10:45
Okinawa Okinawaken Seinenkaikan (Naha-shi)
(Primary: On-site, Secondary: Online)
Wiped-Rate Estimation for Semiconductor Manufacturing Using DNN Based on 3D Body Tracking
Takehiro Nagata (Univ. of Tsukuba), Li-Wei Cheng (NCKU), Hidehiko Shishido (Univ. of Tsukuba), Hyejin Kim, Chanya Mahapun, Naoki Yoshii, Tsuyoshi Moriya (TEL), Itaru Kitahara (Univ. of Tsukuba) IMQ2022-67 IE2022-144 MVE2022-97
This research presents a method to calculate the corresponding wiped rate from upper body wiping movements to determine ... [more] IMQ2022-67 IE2022-144 MVE2022-97
pp.235-240
SDM 2022-02-04
09:45
Online Online [Invited Talk] Advanced Damascene Integration with Self Assembled Monolayer (SAM)
Hiroyuki Nagai, Mitsuaki Iwashita, Yuki Kikuchi (TEL), Kawasaki Hiroaki, Gyana Pattanaik (TTCA), Keiichi Fujita (TKL), Kazutoshi Iwai (TEA), Hiroyuki Komatsu, Yuuki Ozaki (JSR) SDM2021-75
Selective deposition of Cu diffusion barrier metal layer on dielectric with Self-Assembled Monolayer (SAM) has been demo... [more] SDM2021-75
pp.5-8
SDM 2020-02-07
11:20
Tokyo Tokyo University-Hongo [Invited Talk] Novel Volatile Film for Precise Dual Damascene Fabrication
Makoto Fujikawa, Tatsuya Yamaguchi (TTS), Yuki Kikuchi, Kaoru Maekawa (TTCA), Hiroaki Kawasaki, Yoji Iizuka (TEL) SDM2019-92
Abstract— Plasma induced damage on porous low-k dielectrics is a critical issue to lower the interconnect RC delay in th... [more] SDM2019-92
pp.21-23
SDM 2019-02-07
10:05
Tokyo   [Invited Talk] High-precision Dual Damascene Fabrication Technique
Takashi Hayakawa, Makoto, Syuji Nozawa, Tatsuya Yamaguchi (TEL)
 [more]
SDM 2017-02-06
11:15
Tokyo Tokyo Univ. [Invited Talk] NiGe/Ge contact formation by microwave annealing method for low-thermal budget processing
Osamu Nakatsuka (Grad. Sch. of Eng., Nagoya University), Yoshimasa Watanabe (TEL), Akihiro Suzuki (Grad. Sch. of Eng., Nagoya University), Yoshio Nishi (Dept. of Electrical Engineering, Stanford University), Shigeaki Zaima (IMaSS, Nagoya University) SDM2016-141
 [more] SDM2016-141
pp.11-15
SDM 2014-02-28
09:30
Tokyo Kikai-Shinko-Kaikan Bldg. [Invited Talk] Large-Radius Neutral Beam Enhanced Chemical Vapor Deposition Process for Non-Porous Ultra-low-k SiOCH
Yoshiyuki Kikuchi (Tokyo Electron/Tohoku Univ.), Seiji Samukawa (Tohoku Univ.) SDM2013-165
 [more] SDM2013-165
pp.1-5
SDM 2013-06-18
15:30
Tokyo Kikai-Shinko-Kaikan Bldg. [Invited Lecture] Implementation of High-k Gate Dielectrics in SiC Power MOSFET
Takuji Hosoi (Osaka Univ.), Shuji Azumo, Yusaku Kashiwagi, Shigetoshi Hosaka (Tokyo Electron), Ryota Nakamura, Yuki Nakano, Hirokazu Asahara, Takashi Nakamura (ROHM), Tsunenobu Kimoto (Kyoto Univ.), Takayoshi Shimura, Heiji Watanabe (Osaka Univ.) SDM2013-59
 [more] SDM2013-59
pp.77-80
SDM 2006-06-21
14:55
Hiroshima Faculty Club, Hiroshima Univ. Characterization of open volumes in high-k gate dielectrics by using monoenergetic positron beams
Akira Uedono, T. Otsuka, K. Ito, K. Shiraishi, Kikuo Yamabe (Univ. of Tsukuba), Seiichi Miyazaki (Hiroshima Univ.), Naoto Umezawa, Toyohiro Chikyow (NIMS), Toshiyuki Ohdaira, R. Suzuki (AIST), Seiji Inumiya, Satoshi Kamiyama (Selete), Yasushi Akasaka (TEL), Yasuo Nara (Selete), Keisaku Yamada (Waseda Uni.)
 [more] SDM2006-46
pp.25-30
SIP, ICD, IE, IPSJ-SLDM 2005-10-21
15:50
Miyagi Ichinobo, Sakunami-Spa A cell library development methodology for character projection
Makoto Sugihara (ISIT), Taiga Takata, Kenta Nakamura (Kyushu Univ.), Ryoichi Inanami (e-BEAM), Hiroaki Hayashi (Tokyo Electron), Katsumi Kishimoto (e-BEAM), Tetsuya Hasebe (Tokyo Electron), Yukihiro Kawano (e-BEAM), Yusuke Matsunaga, Kazuaki Murakami (Kyushu Univ.), Katsuya Okumura (Univ. of Tokyo)
We propose a cell library development methodology for throughput enhancement of electron beam direct-write (EBDW) system... [more] SIP2005-128 ICD2005-147 IE2005-92
pp.79-84
 Results 1 - 9 of 9  /   
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