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Technical Committee on Component Parts and Materials (CPM) [schedule] [select]
Chair Kiyoshi Ishii
Vice Chair Kiichi Kamimura
Secretary Toru Matsuura, Seiji Toyoda
Assistant Hidehiko Shimizu, Yasushi Takemura

Conference Date Thu, Nov 9, 2006 13:30 - 17:25
Fri, Nov 10, 2006 09:00 - 12:05
Topics Process of Thin Film formation and Materials, etc. 
Conference Place Kakuma Campus, Kanazawa University 
Address Kakuma-machi, Kanazawa, Ishikawa, 920-1192 Japan
Transportation Guide http://www.ad.kanazawa-u.ac.jp/exchange/location/
Contact
Person
Prof. Akiharu Morimoto
076-234-4876

Thu, Nov 9 PM 
13:30 - 17:25
(1) 13:30-13:55 Prepration of AZO thin films by sputtering method Ayumu Kawakami, Toru Noguchi, Akiyuki Higashide, Shinsuke Miyazaki, Hidehiko Shimizu, Takeo Maruyama, Haruo Iwano, Takahiro Kawakami (Niigata Univ.), Yoichi Hoshi (T.P.U.)
(2) 13:55-14:20 Prepration of ITO thin films on plastic substrate. Masaki Takeuchi, Kazuya Morishita, Takeshi Umetsu, Yusuke Nakata, Shinsuke Miyazaki, Hidehiko Shimizu, Takeo Maruyama, Haruo Iwano, Takahiro Kawakami (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnics Univ.), Masahiro Minagawa (Nippon Seiki)
(3) 14:20-14:45 Fabrication of Cr2O3 Thin Films by RF Magnetron Sputtering Takeshi Asada, Kenjirou Nagase, Takayuki Yamada, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon univ)
(4) 14:45-15:10 Growth Control of Carbon Nanotubes on Ni/Mo Bilayer Hiroki Okuyama, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.)
  15:10-15:20 Break ( 10 min. )
(5) 15:20-15:45 Cathodo-Luminescence study of AlInN films grown by RF-MBE Yu Mimura, Wataru Terashima, Song-Bek Che, Yoshihiro Ishitani, Akihiko Yoshikawa (Chiba Univ.)
(6) 15:45-16:10 Reactive Sputter Deposition of AlN Film and Its Application to LD Submount Akihiro Shiono, Masahide Nakakuki, Isao Kobayashi, Tomohiko Yamakami, Rinpei Hayashibe (Shinshu Univ.), Motoki Obata (CITIZEN FINE TECH), Katsuya Abe, Kiichi Kamimura (Shinshu Univ.)
(7) 16:10-16:35 Thermal stability and interface morphology in Cu/ZrN/SiOC/Si system Atsushi Noya, Masaru Sato, Mayumi B. Takeyama (Kitami Inst. of Technol.), Eiji Aoyagi (Tohoku Univ.)
(8) 16:35-17:00 Novel PVD process of extremely-thin TiNx barrier with radical reaction for Cu interconnects Mayumi B. Takeyama, Tadayoshi Yanagita, Atsushi Noya (Kitami Inst. of Technol.)
(9) 17:00-17:25 Barrier properties of HfNx thin films prepared by hot wire method between Cu interconnects and SiO2 or SiOC layer Masaru Sato, Mayumi B. Takeyama, Atsushi Noya (Kitami Inst. of Technol.)
Fri, Nov 10 AM 
09:00 - 12:05
(10) 09:00-09:25 Surface roughness control of SiGe layer deposited by Ion Beam Sputtering toward strained Si fabrication Jun Yamamoto, Yuta Sakaguchi, Kimihiro Naruse, Kimihiro Sasaki (Kanazawa Univ.)
(11) 09:25-09:50 Thermoelectric performance of deteriorated SiGe thin films
-- influence from substrate --
Akinari Matoba, Toshio Hayahira, Takahiro Tsuduki, Kimihiro Sasaki (Kanazawa Univ.), Youich Okamoto, Jun Morimoto (Defense Univ.)
(12) 09:50-10:15 Formation of high density nanodots aiming for Ge embedded SiC Tetsushi Kanemaru, Tomoaki Ogiwara, Kanji Yasui, Tadashi Akahane, Masasuke Takata (Nagaoka Univ. Tech.)
(13) 10:15-10:40 Degradation of MOVPE InN during the growth Kenichi Sugita, Yoshinori Hochin, Akihiro Hashimoto, Akio Yamamoto (Univ. of Fukui)
  10:40-10:50 Break ( 10 min. )
(14) 10:50-11:15 Growth delay time on fabricating thin ZrO2 film by limited reaction sputtering Hidetaka Sugiyama, Nobuo Kojima, Taro Yamagishi, Zhou Ying, Kimihiro Sasaki (Kanazawa Univ.)
(15) 11:15-11:40 The practical sputtering system for oxide films by oxygen ion implantation Shinobu Chiba, Kimihiro Sasaki (Kanazawa Univ.), Akira Motoki (CBC Co.,Ltd), Tomonobu Hata (JST), Akihiko Ito (SHIBAURA MECHATRONICS Corp.)
(16) 11:40-12:05 Effect of Surface Roughness of Substrate on Structure and Temperature Coefficient of Resistance (TCR) of NiCr Films Deposited by Sputtering Satoshi Iwatsubo, Takaaki Shimizu (Toyama Ind. Tech. Ctr.)

Announcement for Speakers
General Talk (25)Each speech will have 20 minutes for presentation and 5 minutes for discussion.

Contact Address and Latest Schedule Information
CPM Technical Committee on Component Parts and Materials (CPM)   [Latest Schedule]
Contact Address Hidehiko Shimizu(Niigata University)
TEL 025-262-6811, FAX 025-262-6811
E-: engi-u

Akiharu Morimoto (Kanazawa University)
TEL 076-234-4876, FAX 076-234-4870
E-: atect-u

Kanji Yasui(Nagaoka Univ. of Technol.)
TEL 0258-47-9502 FAX 0258-47-9500
E-: kivosut 


Last modified: 2006-10-30 21:12:26


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