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Technical Committee on Silicon Device and Materials (SDM) [schedule] [select]
Chair Tetsuro Endo (Tohoku Univ.)
Vice Chair Yasuo Nara (Fujitsu Microelectronics)
Secretary Yukinori Ono (NTT), Katsunori Onishi (Kyushu Inst. of Tech.)
Assistant Shintaro Nomura (Univ. of Tsukuba)

Conference Date Fri, Dec 17, 2010 10:00 - 17:45
Topics Fabrication and Characterization of Si and Si-related Materials 
Conference Place A1 Building, Katsura Campus, Kyoto University 
Address A1, Katsura, Nishikyo, Kyoto, 615-8510, Japan
Transportation Guide Please take a bus from the Hankyu-Katsura station.
http://www.kyoto-u.ac.jp/ja/access/campus/map6r_k.htm
Contact
Person
Tsunenobu Kimoto, Kyoto University
+81-75-383-2300
Announcement Please join us for a reception after the meeting.
Copyright
and
reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)

Fri, Dec 17 AM 
10:00 - 12:20
(1) 10:00-10:20 Bandgap of <100> Si Nanowires Derived from Threshold Voltage of MOSFETs and Theoritical Calculations SDM2010-185 Hironori Yoshioka, Naoya Morioka, Jun Suda, Tsunenobu Kimoto (Kyoto Univ.)
(2) 10:20-10:40 X-Ray Detectors (Silicon Drift Detectors) using Higher-Resistivity Si
-- Simulation Results --
SDM2010-186
Seigo Kitanoya, Seiji Nishikawa, Hideharu Matsuura (Osaka Electro-Communication Univ.)
(3) 10:40-11:00 Ion channeling at Heusler alloy Fe3-xMnxSi(111)/Ge(111) heteroepitaxial interfaces SDM2010-187 Takahito Nakajima, Bui Matsukura (Kyoto Univ.), Kazumasa Narumi (JAEA), Yoshihito Maeda (Kyoto Univ.)
(4) 11:00-11:20 Improvement of Luminescence Property of ZnS Inorganic EL by Atomization Treatment of Phosphor SDM2010-188 Shogo Horiguchi, Takuya Kontani, Masahiro Horita (NAIST), Nobuyoshi Taguchi (ITI), Yukiharu Uraoka (NAIST/CREST)
(5) 11:20-11:40 Laser Doping at Room Temperature in Multi-Crystalline Silicon Solar Cell Process SDM2010-189 Mitsuhiro Hasegawa, Kenji Hirata, Tamaki Takayama, Tomohiro Funatani, Takashi Fuyuki (NAIST)
(6) 11:40-12:00 Optimization of Laser Doping by Controlled Dopant Precursor Layer in Silicon Solar Cell Process SDM2010-190 Tomohiro Funatani, Kenji Hirata, Tamaki Takayama, Mitsuhiro Hasegawa, Takashi Fuyuki (NAIST)
(7) 12:00-12:20 Effect of H2-N2 Plasma Exposure on Nanostructured Silicon SDM2010-191 Akitsugu Watanabe, Kenichi Suda, Hideki Nakada, Mitsuya Motohashi (Tokyo Denki Univ.)
  12:20-13:20 Lunch Break ( 60 min. )
Fri, Dec 17 PM 
13:20 - 15:30
(8) 13:20-13:50 [Invited Talk]
Estimation of Physical Properties and Control of Memory Performance in ReRAM SDM2010-192
Kentaro Kinoshita, Takatoshi Yoda, Hayato Tanaka, Akihiro Hanada, Satoru Kishida (Tottori Univ.)
(9) 13:50-14:10 Effects of thermal treatment in vacuum on the electrical characteristics of Pt/NiO/Pt stack structures for ReRAM SDM2010-193 Tatsuya Iwata, Yusuke Nishi, Tsunenobu Kimoto (Kyoto Univ.)
(10) 14:10-14:30 Effects of Sacrifice Oxidation on Characterization of Defects in High-Purity Semi-Insulating 4H-SiC by Discharge Current Transient Spectroscopy SDM2010-194 Seiji Nishikawa, Seigo Kitanoya, Hideharu Matsuura (Osaka Electro-Communication Univ.)
(11) 14:30-14:50 Change of majority carrier density in 4H-SiC epilayer by 200keV electron irradiation SDM2010-195 Takunori Nojiri, Kozo Nishino, Hideki Yanagisawa, Hideharu Matsuura (Osaka Electro-Communication Univ.), Shinobu Onoda, Takeshi Ohshima (JAEA)
(12) 14:50-15:10 Properties of the oxidized layers on SiC in supercritical water SDM2010-196 Tomohisa Satoh (Osaka Univ.), Takashi Futatsuki, Taro Oe (Organo), Naoyoshi Komatsu, Chiharu Kimura, Hidemitsu Aoki (Osaka Univ.)
(13) 15:10-15:30 Irradiation Effects of Silicon Surface by Polyatomic Ion Beams SDM2010-197 Mitsuaki Takeuchi, Hiromichi Ryuto, Gikan H. Takaoka (Kyoto Univ.)
  15:30-15:45 Break ( 15 min. )
Fri, Dec 17 PM 
15:45 - 17:45
(14) 15:45-16:05 Photoluminescence and deep level transient spectroscopy study on recrystallization of ultra-shallow junction SDM2010-198 Masashi Okutani, Shuhei Takashima, Masahiro Yoshimoto (KIT), Woo Sik Yoo (WaferMasters, Inc.)
(15) 16:05-16:25 Lateral Large-Grained Low-Temperature Poly-Si1-xGex TFTs on Glass Substrate SDM2010-199 Yasunori Okabe, Kenji Kondo (Tohoku Gakuin Univ.), Kenta Hirose, Junki Suzuki, Kuninori Kitahara (Shimane Univ.), Akito Hara (Tohoku Gakuin Univ.)
(16) 16:25-16:45 Evaluation of two layers simultaneous crystallized LTPS-TFT memory by the laser irradiation from the back. SDM2010-200 Masahiro Matsue, Kazunori Ichikawa, Hiroshi Akamatsu (KCCT), Koji Yamasaki, Masahiro Horita, Yukiharu Uraoka (NAIST)
(17) 16:45-17:05 Study for DNA-Field Effect Transistor with Si gate SDM2010-201 Shogo Takagi, Naoto Matsuo, Kazushige Yamana, Akira Heya, Tadao Takada (Univ of Hyogo), Kenji Sakamoto, Shin Yokoyama (Hiroshima Univ)
(18) 17:05-17:25 Neural Network at Device Level using Poly-Si TFT
-- Learning of multiple times and learning of AND, OR, EXOR --
SDM2010-202
Tomoaki Miyatani, Yusuke Fujita (Ryukoku Univ), Daiki Mishima (NAIST), Jin Taniguchi, Tomohiro Kasakawa, Mutsumi Kimura (Ryukoku Univ)
(19) 17:25-17:45 Effect of high pressure vapor anneal treatment on the a-In2Ga2Zn1O7 TFTs characteristics SDM2010-203 Tomoki Maruyama, Mami Fujii (NAIST), Masashi Kasami, Koki Yano (Idemitsu Kosan), Masahiro Horita, Yasuaki Ishikawa (NAIST), Yukiharu Uraoka (NAIST/JST-CREST)

Announcement for Speakers
General TalkEach speech will have 15 minutes for presentation and 5 minutes for discussion.
Invited TalkEach speech will have 25 minutes for presentation and 5 minutes for discussion.

Contact Address and Latest Schedule Information
SDM Technical Committee on Silicon Device and Materials (SDM)   [Latest Schedule]
Contact Address Tsunenobu Kimoto (Kyoto University)
Tel: 075-383-2300 Fax: 075-383-2303
E--mail: eek-u 


Last modified: 2010-10-21 09:07:39


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