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Technical Committee on Component Parts and Materials (CPM)
Chair: Mayumi Takeyama (Kitami Inst. of Tech.) Vice Chair: Yuichi Nakamura (Toyohashi Univ. of Tech.)
Secretary: Hideki Nakazawa (Hirosaki Univ.)
Assistant: Yasuo Kimura (Tokyo Univ. of Tech.), Tomoaki Terasako (Ehime Univ.), Fumihiko Hirose (Yamagata Univ.)

DATE:
Thu, Nov 7, 2019 13:30 - 16:40
Fri, Nov 8, 2019 10:00 - 11:40

PLACE:


TOPICS:


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Thu, Nov 7 PM (13:30 - 16:40)
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(1) 13:30 - 13:55
Development of Methods for Early Detection of Plant Growth Disorder by Hyper/Multispectral Camera under Artificial Light
Koji Kashima, Shiho Torashima, Hiroyuki Ito, Katsuro Fukozu, Takayuki Ohba (Tokyo Tech)

(2) 13:55 - 14:20
Thermal deposition of antimony sulfide thin films
Yasushi Takano, Sho Inoue (Shizuoka Univ.)

(3) 14:20 - 14:45
Study on Cu orientation control on ultra-thin TaWN film
Mayumi B. Takeyama, Masaru Sato (Kitami Inst. of Technol.)

----- Break ( 15 min. ) -----

(4) 15:00 - 15:25
Annealing effects on the properties of nitrogen doped DLC films
Hiroya Osanai, Kazuki Nakamura, Haruto Koriyama, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki (Hirosaki Univ.), Maki Suemitsu (Tohoku Univ.), Hideki Nakazawa (Hirosaki Univ.)

(5) 15:25 - 15:50
Nitrogen doping to ZnO films in a catalytic reaction assisted chemical vapor deposition
Ryuta Iba, Hiroki Kambayashi, Yuki Adachi (NUT), Koichiro Oishi, Hironori Katagiri (NITNC), Kanji Yasui (NUT)

(6) 15:50 - 16:40
[Invited Talk]
Metal-oxide film growth by catalytic-reaction assisted chemical vapor deposition
Kanji Yasui (Nagaoka Univ. Technol.)

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Fri, Nov 8 AM (10:00 - 11:40)
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(7) 10:00 - 10:25
Characterization of ZrNx films deposited at room temperature by RF sputtering
Masaru Sato, Mayumi B. Takeyama (Kitami Inst. of Technol.)

(8) 10:25 - 10:50
Change in Electrical Characteristics with Change of Channel Structure in Integrated FET Using Piezoelectric Film P (VDF-TrFE) as Gate Insulator
Shusaku Matsumoto, Takuya Okayama, Akio Furukawa (Tokyo Univ. of Science)

(9) 10:50 - 11:40
[Invited Talk]
Mapping of metal/semiconductor and semiconductor/semiconductor interfaces using scanning internal photoemission microscopy
Kenji Shiojima (Univ. of Fukui)

# Information for speakers
General Talk will have 20 minutes for presentation and 5 minutes for discussion.
Invited Talk will have 40 minutes for presentation and 10 minutes for discussion.


=== Technical Committee on Component Parts and Materials (CPM) ===
# FUTURE SCHEDULE:

Thu, Nov 21, 2019 - Fri, Nov 22, 2019: Shizuoka Univ. (Hamamatsu) [Fri, Sep 13], Topics: Nitride Semiconductor Devices, Materials, Related Technologies
Tue, Nov 26, 2019 (tentative): Japan Society for the Promotiton of Machine Industry [Tue, Sep 17]
Fri, Feb 28, 2020 - Sat, Feb 29, 2020 (tentative): Presentation Rm., KCB01, Tokyo Univ. of Technol. [Fri, Jan 24], Topics: Young Researcher's Conference


Last modified: 2019-09-19 07:22:38


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