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Technical Committee on Component Parts and Materials (CPM) [schedule] [select]
Chair Kanji Yasui (Nagaoka Univ. of Tech.)
Vice Chair Yasushi Takemura (Yokohama National Univ.)
Secretary Tadayuki Imai (NTT), Satoru Noge (Numazu National College of Tech.)
Assistant Toshishige Shimamura (NTT), Katsuya Abe (Shinshu Univ.)

Technical Committee on Lasers and Quantum Electronics (LQE) [schedule] [select]
Chair Hitoshi Kawaguchi (NAIST)
Vice Chair Tsukuru Katsuyama (Sumitomo Electric Industries)
Secretary Kenji Sato (NEC), Tomoyuki Miyamoto (Tokyo Inst. of Tech.)

Technical Committee on Electron Device (ED) [schedule] [select]
Chair Tamotsu Hashidume (Hokkaido Univ.)
Vice Chair Tetsu Kachi (Toyota Central R&D Labs.)
Secretary Naoki Hara (Fujitsu Labs.), Kunio Tsuda (Toshiba)
Assistant Michihiko Suhara (Tokyo Metropolitan Univ.), Tetsuzo Ueda (Panasonic)

Conference Date Thu, Nov 11, 2010 10:00 - 17:15
Fri, Nov 12, 2010 10:00 - 17:00
Topics  
Conference Place Osaka Univ. Nakanoshima Center 
Address 4-3-53 Nakanoshima, Kita-ku, Osaka-shi, 530-0005 Japan
Transportation Guide http://www.onc.osaka-u.ac.jp/others/map/index.php
Contact
Person
Dr. T. Ueda, Panasonic
+81-6-6444-21

Thu, Nov 11 AM 
10:00 - 11:40
(1) 10:00-10:25 Optical properties of ZnO films grown on sapphire substrates using high-energy H2O generated by a catalytic reaction Hitoshi Miura, Takashi Otani, Tomoyoshi Kuroda, Hiroshi Nishiyama, Kanji Yasui (Nagaoka Univ. Technol.)
(2) 10:25-10:50 Study on improved crystal quality of non-polar A-plane InN grown on r-plane sapphire by RF-MBE Tsutomu Araki, Keisuke Kawashima, Tomohiro Yamaguchi, Yasushi Nanishi (Ritsumeikan Univ.)
(3) 10:50-11:15 GaN growth on pseudo (111)Al substrates by RF-MBE Tohru Honda, Masato Hayashi, Taiga Goto, Tatsuhiro Igaki (Kogakuin Univ.)
(4) 11:15-11:40 Growth characteristics of GaNP layer and InAs-based QDs on Si substrate Satoru Tanabe, Rei Nishio, Yoshitaka Kobayashi, Kosuke Nemoto, Tomoyuki Miyamoto (Tokyo Inst. of Tech.)
Thu, Nov 11 PM 
13:00 - 17:15
(5) 13:00-13:25 AlN growth on SiC by LP-HVPE Kenta Okumura, Takuya Nomura, Hideto Miyake, Kazumasa Hiramatsu (Mie Univ.), Osamu Eryu (NIT)
(6) 13:25-13:50 ELO-AlN on trench-patterned AlN/sapphire by low-pressure HVPE Kohei Fujita, Hideto Miyake, Kazumasa Hiramatsu (Mie Univ.), Jyun Norimatsu, Hideki Hirayama (Riken)
(7) 13:50-14:15 Fabrication and characterization of Si-doped AlGaN for deep-ultraviolet light-source by EB excitation Yuki Shimahara, Hideto Miyake, Kazumasa Hiramatsu (Mie Univ.), Fumitsugu Fukuyo, Tomoyuki Okada, Hidetsugu Takaoka, Harumasa Yoshida (HPK)
  14:15-14:30 Break ( 15 min. )
(8) 14:30-14:55 A Comprehensive Understanding of Previously-Reported Polarization Properties in Nonpolar and Semipolar InGaN Quantum Wells Atsushi Yamaguchi (Kanazawa Inst. Tech.), Kazunobu Kojima (Kyoto Univ.)
(9) 14:55-15:20 Carrier diffusion dynamics in InGaN/GaN SQW studied by spatial and temporal resolved PL spectroscopy
-- Efficiency droop mechanism assessed by SNOM --
Akira Hashiya, Akio Kaneta, Mitsuru Funato, Yoichi Kawakami (Kyoto Univ.)
(10) 15:20-15:45 100 mW Deep Ultraviolet Emission from AlGaN/AlN Quantum Wells by Electron Beam Pumping Takao Oto, Ryan G. Banal (Kyoto Univ.), Ken Kataoka (Ushio Inc.), Mitsuru Funato, Yoichi Kawakami (Kyoto Univ.)
(11) 15:45-16:10 High Efficiency AlInN Ultraviolet Photodiodes on AlN Template Yusuke Sakai, Junki Ichikawa, Takashi Egawa (Nagoya Inst. of Tech.)
  16:10-16:25 Break ( 15 min. )
(12) 16:25-16:50 Current control of AlGaN/GaN HEMT with multi-mesa nanochannels Kota Ohi, Tamotsu Hashizume (Hokkaido Univ.)
(13) 16:50-17:15 High-Power GaN-HEMT for Millimeter-Wave Amplifier Kozo Makiyama, Toshihiro Ohki, Naoya Okamoto, Masahito Kanamura, Satoshi Masuda, Yasuhiro Nakasha, Kazukiyo Joshin, Kenji Imanishi (Fujitsu, Fujitsu Labs.), Naoki Hara, Shiro Ozaki, Norikazu Nakamura (Fujitsu Labs.), Toshihide Kikkawa (Fujitsu, Fujitsu Labs.)
Fri, Nov 12 AM 
10:00 - 11:40
(14) 10:00-10:25 Characterization of insulated gates on GaN and AlGaN/GaN structures Yujin Hori, Naohisa Harada, Chihoko Mizue, Tamotsu Hashizume (Hokkaido Univ.)
(15) 10:25-10:50 Study of etching-induced damage in p-type GaN by hard X-ray photoelectron spectroscopy Daigo Kikuta, Tetsuo Narita, Naoko Takahashi, Keita Kataoka, Yasuji Kimoto, Tsutomu Uesugi, Tetsu Kachi (Toyota CRDL, Inc.), Masahiro Sugimoto (Toyota Motor Corp.)
(16) 10:50-11:15 Vertical GaN Diode on GaN Free-Standing Substrate Shuichi Yagi, Shoko Hirata, Yasunobu Sumida, Masahiro Bessho, Hiroji Kawai (POWDEC), Toshiharu Matsueda, Akira Usui (Furukawa Co., Ltd.)
(17) 11:15-11:40 Vertical Heterojunction Field-Effect Transistors on Low Dislocation Density GaN Substrates Masaya Okada, Yu Saitoh, Mitsunori Yokoyama, Ken Nakata, Seiji Yaegassi, Koji Katayama, Masaki Ueno, Makoto Kiyama, Tsukuru Katsuyama, Takao Nakamura (SEI)
Fri, Nov 12 PM 
13:00 - 17:00
  - [Panel Session] GaN Power Devices
Chair:T. Hasizume (Hokkaido Univ.)

Announcement for Speakers
General TalkEach speech will have 20 minutes for presentation and 5 minutes for discussion.

Contact Address and Latest Schedule Information
CPM Technical Committee on Component Parts and Materials (CPM)   [Latest Schedule]
Contact Address  
LQE Technical Committee on Lasers and Quantum Electronics (LQE)   [Latest Schedule]
Contact Address Kenji Sato (NEC Corp.)
TEL +81-44-431-7616, FAX +81-44-431-7619
E--mail: snc

Tomoyuki Miyamoto (Tokyo Institute of Technology)
TEL +81-45-924-5059, FAX +81-45-924-5977
E--mail: ttpi 
Announcement Homepage of LQE is http://www.ieice.org/~lqe/jpn/
ED Technical Committee on Electron Device (ED)   [Latest Schedule]
Contact Address Hara Naoki (Fujitsu Lab.)
TEL : +81-46-250-8242、FAX : +81-46-250-8168
E--mail : o
Kunio Tsuda(Toshiba)
TEL : +81-44-549-2142、FAX : +81-44-520-1501
E--mail : oba
Michihiko Suhara (Tokyo Metropolitan Univ.)
TEL : +81-42-677-2765 Fax : +81-42-677-2756
E--mail : t
Tetsuzo Ueda(Panasonic)
TEL:+81-75-956-8273、FAX:+81-75-956-9110
E--mailzopac 


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