Paper Abstract and Keywords |
Presentation |
2022-08-04 16:15
Hydrogen gas effects on the properties of boron carbide films prepared by magnetron sputtering Nishida Tatsuya, Taniguchi Ryu, Masayoshi Sato, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki (Hirosaki Univ.), Hirokazu Fukidome (Touhoku Univ.), Hideki Nakazawa (Hirosaki Univ.) CPM2022-15 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We have deposited amorphous boron carbide (B4C) films and hydrogenated amorphous B4C (B4C:H) films by RF magnetron sputtering without H2 and with H2, respectively, using a B4C target and investigated the effects of hydrogen on the properties of the B4C and B4C:H films. The critical loads of the B4C:H films, as obtained from scratch tests, were smaller than that of the B4C film, and the critical load of the B4C:H films increased with increasing hydrogen flow ratio. It was found that the critical load was negatively correlated with internal stress. The friction coefficient and specific wear rate of the B4C:H films tended to decrease with the hydrogen flow ratio. The optical bandgap (Eg) and resistivity of the B4C:H films were greater than those of the B4C film. As the hydrogen flow ratio increased, the Eg and resistivity of the B4C:H films increased, probably due to a decrease in sp2 C=C bonds caused by the introduction of hydrogen. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Boron carbide / Hydrogen / Sputtering / Mechanical properties / Tribological properties / Optical bandgap / Resistivity / |
Reference Info. |
IEICE Tech. Rep., vol. 122, no. 147, CPM2022-15, pp. 14-17, Aug. 2022. |
Paper # |
CPM2022-15 |
Date of Issue |
2022-07-28 (CPM) |
ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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