Paper Abstract and Keywords |
Presentation |
2021-12-02 15:35
Mask Optimization Method Using Simulated Quantum Annealing Yukihide Kohira, Haruki Nakayama, Naoki Nonaka (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA Corporation) VLD2021-45 ICD2021-55 DC2021-51 RECONF2021-53 Link to ES Tech. Rep. Archives: ICD2021-55 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
To realize continuously scaling down of technology node, progressing manufacturing process by optical lithography is required. In resolution enhancement techniques in the optical lithography, Optical Proximity Correction (OPC), which improves shape fidelity of formed patterns on wafers to designed target patterns by mask optimization, is essential. It is known that the mask optimization can be formulated as 0-1 Quadratic Programming problem (0-1 QP). Recently, Quantum Annealing, which solves 0-1 QP in a short computation time, has attracted attention. In this paper, we examine a method using Simulated Quantum Annealing (SQA) for the mask optimization problem to obtain a mask with high fidelity to target patterns as well as high tolerance to process variation. In experiments, we evaluate the method using SQA and existing methods in fidelity to target patterns, tolerance to process variation, and execution time. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
optical lithography / mask optimization / Optical Proximity Correction (OPC) / Simulated Quantum Annealing / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 121, no. 277, VLD2021-45, pp. 162-167, Dec. 2021. |
Paper # |
VLD2021-45 |
Date of Issue |
2021-11-24 (VLD, ICD, DC, RECONF) |
ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
VLD2021-45 ICD2021-55 DC2021-51 RECONF2021-53 Link to ES Tech. Rep. Archives: ICD2021-55 |
Conference Information |
Committee |
VLD DC RECONF ICD IPSJ-SLDM |
Conference Date |
2021-12-01 - 2021-12-02 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Online |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Design Gaia 2021 -New Field of VLSI Design- |
Paper Information |
Registration To |
VLD |
Conference Code |
2021-12-VLD-DC-RECONF-ICD-SLDM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Mask Optimization Method Using Simulated Quantum Annealing |
Sub Title (in English) |
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Keyword(1) |
optical lithography |
Keyword(2) |
mask optimization |
Keyword(3) |
Optical Proximity Correction (OPC) |
Keyword(4) |
Simulated Quantum Annealing |
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1st Author's Name |
Yukihide Kohira |
1st Author's Affiliation |
The University of Aizu (Univ. of Aizu) |
2nd Author's Name |
Haruki Nakayama |
2nd Author's Affiliation |
The University of Aizu (Univ. of Aizu) |
3rd Author's Name |
Naoki Nonaka |
3rd Author's Affiliation |
The University of Aizu (Univ. of Aizu) |
4th Author's Name |
Tomomi Matsui |
4th Author's Affiliation |
Tokyo Institute of Technology (Tokyo Tech) |
5th Author's Name |
Atsushi Takahashi |
5th Author's Affiliation |
Tokyo Institute of Technology (Tokyo Tech) |
6th Author's Name |
Chikaaki Kodama |
6th Author's Affiliation |
KIOXIA Corporation (KIOXIA Corporation) |
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Speaker |
Author-1 |
Date Time |
2021-12-02 15:35:00 |
Presentation Time |
25 minutes |
Registration for |
VLD |
Paper # |
VLD2021-45, ICD2021-55, DC2021-51, RECONF2021-53 |
Volume (vol) |
vol.121 |
Number (no) |
no.277(VLD), no.278(ICD), no.279(DC), no.280(RECONF) |
Page |
pp.162-167 |
#Pages |
6 |
Date of Issue |
2021-11-24 (VLD, ICD, DC, RECONF) |
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