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Presentation 2021-12-02 15:35
Mask Optimization Method Using Simulated Quantum Annealing
Yukihide Kohira, Haruki Nakayama, Naoki Nonaka (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA Corporation) VLD2021-45 ICD2021-55 DC2021-51 RECONF2021-53 Link to ES Tech. Rep. Archives: ICD2021-55
Abstract (in Japanese) (See Japanese page) 
(in English) To realize continuously scaling down of technology node, progressing manufacturing process by optical lithography is required. In resolution enhancement techniques in the optical lithography, Optical Proximity Correction (OPC), which improves shape fidelity of formed patterns on wafers to designed target patterns by mask optimization, is essential. It is known that the mask optimization can be formulated as 0-1 Quadratic Programming problem (0-1 QP). Recently, Quantum Annealing, which solves 0-1 QP in a short computation time, has attracted attention. In this paper, we examine a method using Simulated Quantum Annealing (SQA) for the mask optimization problem to obtain a mask with high fidelity to target patterns as well as high tolerance to process variation. In experiments, we evaluate the method using SQA and existing methods in fidelity to target patterns, tolerance to process variation, and execution time.
Keyword (in Japanese) (See Japanese page) 
(in English) optical lithography / mask optimization / Optical Proximity Correction (OPC) / Simulated Quantum Annealing / / / /  
Reference Info. IEICE Tech. Rep., vol. 121, no. 277, VLD2021-45, pp. 162-167, Dec. 2021.
Paper # VLD2021-45 
Date of Issue 2021-11-24 (VLD, ICD, DC, RECONF) 
ISSN Online edition: ISSN 2432-6380
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Download PDF VLD2021-45 ICD2021-55 DC2021-51 RECONF2021-53 Link to ES Tech. Rep. Archives: ICD2021-55

Conference Information
Committee VLD DC RECONF ICD IPSJ-SLDM  
Conference Date 2021-12-01 - 2021-12-02 
Place (in Japanese) (See Japanese page) 
Place (in English) Online 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Design Gaia 2021 -New Field of VLSI Design- 
Paper Information
Registration To VLD 
Conference Code 2021-12-VLD-DC-RECONF-ICD-SLDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Mask Optimization Method Using Simulated Quantum Annealing 
Sub Title (in English)  
Keyword(1) optical lithography  
Keyword(2) mask optimization  
Keyword(3) Optical Proximity Correction (OPC)  
Keyword(4) Simulated Quantum Annealing  
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1st Author's Name Yukihide Kohira  
1st Author's Affiliation The University of Aizu (Univ. of Aizu)
2nd Author's Name Haruki Nakayama  
2nd Author's Affiliation The University of Aizu (Univ. of Aizu)
3rd Author's Name Naoki Nonaka  
3rd Author's Affiliation The University of Aizu (Univ. of Aizu)
4th Author's Name Tomomi Matsui  
4th Author's Affiliation Tokyo Institute of Technology (Tokyo Tech)
5th Author's Name Atsushi Takahashi  
5th Author's Affiliation Tokyo Institute of Technology (Tokyo Tech)
6th Author's Name Chikaaki Kodama  
6th Author's Affiliation KIOXIA Corporation (KIOXIA Corporation)
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Speaker Author-1 
Date Time 2021-12-02 15:35:00 
Presentation Time 25 minutes 
Registration for VLD 
Paper # VLD2021-45, ICD2021-55, DC2021-51, RECONF2021-53 
Volume (vol) vol.121 
Number (no) no.277(VLD), no.278(ICD), no.279(DC), no.280(RECONF) 
Page pp.162-167 
#Pages
Date of Issue 2021-11-24 (VLD, ICD, DC, RECONF) 


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