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Paper Abstract and Keywords
Presentation 2021-10-21 10:45
[Invited Talk] Influence of Fluorine on Reliabilities of SiO2 and SixNy Films
Yuichiro Mitani (Tokyo City Univ.) SDM2021-44 Link to ES Tech. Rep. Archives: SDM2021-44
Abstract (in Japanese) (See Japanese page) 
(in English) In this paper, the influence of Fluorine incorporation into SiO2 and Si nitride (SixNy) films which are widely used in the nano electronics has been investigated. In the SixNy film, fluorine makes the electron trap level shallower with increasing F dosage. On the other hand, as previously reported in the literatures, fluorine improves SiO2/Si interfaces and bulk though, an excess fluorine degrades the SiO2 film markedly. Re-considering the control of Fluorine incorporation becomes important for realizing highly reliable devices.
Keyword (in Japanese) (See Japanese page) 
(in English) Silicon dioxide / Silicon nitride film / Fluorine / Reliability / / / /  
Reference Info. IEICE Tech. Rep., vol. 121, no. 212, SDM2021-44, pp. 1-4, Oct. 2021.
Paper # SDM2021-44 
Date of Issue 2021-10-14 (SDM) 
ISSN Online edition: ISSN 2432-6380
Copyright
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reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF SDM2021-44 Link to ES Tech. Rep. Archives: SDM2021-44

Conference Information
Committee SDM  
Conference Date 2021-10-21 - 2021-10-21 
Place (in Japanese) (See Japanese page) 
Place (in English) Online 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process Science and New Process Technology 
Paper Information
Registration To SDM 
Conference Code 2021-10-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Influence of Fluorine on Reliabilities of SiO2 and SixNy Films 
Sub Title (in English)  
Keyword(1) Silicon dioxide  
Keyword(2) Silicon nitride film  
Keyword(3) Fluorine  
Keyword(4) Reliability  
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1st Author's Name Yuichiro Mitani  
1st Author's Affiliation Tokyo City University (Tokyo City Univ.)
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Speaker Author-1 
Date Time 2021-10-21 10:45:00 
Presentation Time 50 minutes 
Registration for SDM 
Paper # SDM2021-44 
Volume (vol) vol.121 
Number (no) no.212 
Page pp.1-4 
#Pages
Date of Issue 2021-10-14 (SDM) 


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