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Paper Abstract and Keywords
Presentation 2020-10-29 14:00
Mechanism of Cu(111) orientation control on extremely thin barrier
Mayumi B. Takeyama (Kitami Inst.& Technol.), Mitsunobu Yasuda (Toray Research Center.), Masaru Sato (Kitami Inst.& Technol.) CPM2020-14 Link to ES Tech. Rep. Archives: CPM2020-14
Abstract (in Japanese) (See Japanese page) 
(in English) In Si-LSI and/or 3D-LSI technology, it is strongly desired to obtain Cu(111) orientation with excellent electromigration resistance to achieve high performance Cu interconnects. However, an underlying material with Cu(111) orientation control is poor material selectivity and requires a thick film thickness, so that it has been difficult to realize it with nano-scaled interconnects. We have examined whether Cu(111) orientation can be achieved on an extremely thin barrier by controlling the lattice constant of the barrier. In this study, we succeeded in structural analysis of an extremely thin barrier, which was difficult so far, and were able to clarify some of the mechanism for obtaining Cu(111) orientation. The extremely TaWN barrier with the (111) orientation that provides good lattice matching with Cu(111) with a lattice mismatch of 0.059%. We can successfully demonstrate a preferential orientation of Cu(111) on the 5-nm-thick TaWN barrier.
Keyword (in Japanese) (See Japanese page) 
(in English) LSI / 3D-LSI / Cu(111) orientation / diffusion barrier / TaWN film / underlying material / /  
Reference Info. IEICE Tech. Rep., vol. 120, no. 217, CPM2020-14, pp. 11-14, Oct. 2020.
Paper # CPM2020-14 
Date of Issue 2020-10-22 (CPM) 
ISSN Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee CPM  
Conference Date 2020-10-29 - 2020-10-29 
Place (in Japanese) (See Japanese page) 
Place (in English) Online 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2020-10-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Mechanism of Cu(111) orientation control on extremely thin barrier 
Sub Title (in English)  
Keyword(1) LSI  
Keyword(2) 3D-LSI  
Keyword(3) Cu(111) orientation  
Keyword(4) diffusion barrier  
Keyword(5) TaWN film  
Keyword(6) underlying material  
Keyword(7)  
Keyword(8)  
1st Author's Name Mayumi B. Takeyama  
1st Author's Affiliation Kitami Institute of Technology (Kitami Inst.& Technol.)
2nd Author's Name Mitsunobu Yasuda  
2nd Author's Affiliation Toray Research Center. (Toray Research Center.)
3rd Author's Name Masaru Sato  
3rd Author's Affiliation Kitami Institute of Technology (Kitami Inst.& Technol.)
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Speaker Author-1 
Date Time 2020-10-29 14:00:00 
Presentation Time 20 minutes 
Registration for CPM 
Paper # CPM2020-14 
Volume (vol) vol.120 
Number (no) no.217 
Page pp.11-14 
#Pages
Date of Issue 2020-10-22 (CPM) 


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