Paper Abstract and Keywords |
Presentation |
2020-10-29 14:00
Mechanism of Cu(111) orientation control on extremely thin barrier Mayumi B. Takeyama (Kitami Inst.& Technol.), Mitsunobu Yasuda (Toray Research Center.), Masaru Sato (Kitami Inst.& Technol.) CPM2020-14 Link to ES Tech. Rep. Archives: CPM2020-14 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
In Si-LSI and/or 3D-LSI technology, it is strongly desired to obtain Cu(111) orientation with excellent electromigration resistance to achieve high performance Cu interconnects. However, an underlying material with Cu(111) orientation control is poor material selectivity and requires a thick film thickness, so that it has been difficult to realize it with nano-scaled interconnects. We have examined whether Cu(111) orientation can be achieved on an extremely thin barrier by controlling the lattice constant of the barrier. In this study, we succeeded in structural analysis of an extremely thin barrier, which was difficult so far, and were able to clarify some of the mechanism for obtaining Cu(111) orientation. The extremely TaWN barrier with the (111) orientation that provides good lattice matching with Cu(111) with a lattice mismatch of 0.059%. We can successfully demonstrate a preferential orientation of Cu(111) on the 5-nm-thick TaWN barrier. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
LSI / 3D-LSI / Cu(111) orientation / diffusion barrier / TaWN film / underlying material / / |
Reference Info. |
IEICE Tech. Rep., vol. 120, no. 217, CPM2020-14, pp. 11-14, Oct. 2020. |
Paper # |
CPM2020-14 |
Date of Issue |
2020-10-22 (CPM) |
ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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CPM2020-14 Link to ES Tech. Rep. Archives: CPM2020-14 |
Conference Information |
Committee |
CPM |
Conference Date |
2020-10-29 - 2020-10-29 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Online |
Topics (in Japanese) |
(See Japanese page) |
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Paper Information |
Registration To |
CPM |
Conference Code |
2020-10-CPM |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Mechanism of Cu(111) orientation control on extremely thin barrier |
Sub Title (in English) |
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Keyword(1) |
LSI |
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3D-LSI |
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Cu(111) orientation |
Keyword(4) |
diffusion barrier |
Keyword(5) |
TaWN film |
Keyword(6) |
underlying material |
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1st Author's Name |
Mayumi B. Takeyama |
1st Author's Affiliation |
Kitami Institute of Technology (Kitami Inst.& Technol.) |
2nd Author's Name |
Mitsunobu Yasuda |
2nd Author's Affiliation |
Toray Research Center. (Toray Research Center.) |
3rd Author's Name |
Masaru Sato |
3rd Author's Affiliation |
Kitami Institute of Technology (Kitami Inst.& Technol.) |
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Speaker |
Author-1 |
Date Time |
2020-10-29 14:00:00 |
Presentation Time |
20 minutes |
Registration for |
CPM |
Paper # |
CPM2020-14 |
Volume (vol) |
vol.120 |
Number (no) |
no.217 |
Page |
pp.11-14 |
#Pages |
4 |
Date of Issue |
2020-10-22 (CPM) |
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