Paper Abstract and Keywords |
Presentation |
2020-09-28 14:50
Effect of negative ions generated from ScAl sputtering targets on kt2 and crystal orientation of ScAlN thin films Rui Kihara (Waseda Univ.), Shinji Takayanagi (Doshisha Univ.), Takahiko Yanagitani (Waseda Univ.) US2020-36 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
ScAlN thin films with large electromechanical coupling coefficient have been attracting attention for the application to wideband BAW filters. Sc ingots usually contain oxygen and carbon impurities. Therefore, this result in the O- and CN- negative ions irradiation to the substrate during the sputtering process. These negative ions irradiation would affect the crystal orientation and electromechanical coupling coefficient, kt2 of the piezoelectric thin films. In this study, the negative ions generated from various ScAl sputtering targets were measured. Crystal orientation and kt2 of ScAlN thin films were investigated. We showed that the difference in the intensity of the negative ions generated from each target affects crystal orientation and kt2. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
ScAlN / Piezoelectric thin film / ScAl sputtering target / Negative ion irradiation / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 120, no. 174, US2020-36, pp. 51-56, Sept. 2020. |
Paper # |
US2020-36 |
Date of Issue |
2020-09-21 (US) |
ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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US2020-36 |
Conference Information |
Committee |
US |
Conference Date |
2020-09-28 - 2020-09-28 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Online |
Topics (in Japanese) |
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Paper Information |
Registration To |
US |
Conference Code |
2020-09-US |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Effect of negative ions generated from ScAl sputtering targets on kt2 and crystal orientation of ScAlN thin films |
Sub Title (in English) |
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Keyword(1) |
ScAlN |
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Piezoelectric thin film |
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ScAl sputtering target |
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Negative ion irradiation |
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1st Author's Name |
Rui Kihara |
1st Author's Affiliation |
Waseda University (Waseda Univ.) |
2nd Author's Name |
Shinji Takayanagi |
2nd Author's Affiliation |
Doshisha University (Doshisha Univ.) |
3rd Author's Name |
Takahiko Yanagitani |
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Waseda University (Waseda Univ.) |
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Speaker |
Author-1 |
Date Time |
2020-09-28 14:50:00 |
Presentation Time |
25 minutes |
Registration for |
US |
Paper # |
US2020-36 |
Volume (vol) |
vol.120 |
Number (no) |
no.174 |
Page |
pp.51-56 |
#Pages |
6 |
Date of Issue |
2020-09-21 (US) |
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