Paper Abstract and Keywords |
Presentation |
2020-05-21 12:05
Plasmon Response Analysis of Thin Film Structure for Development of Magnetic Sensing Tomohiro Tamaru, Hironori Shibagaki, Di Wu, Seiya Kishimoto, Yoshito Ashizawa, Katsuji Nakagawa, Shinichiro Ohnuki (Nihon Univ.) EST2020-5 Link to ES Tech. Rep. Archives: EST2020-5 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Electromagnetic field analysis of the Kretschmann arrangement using a mixed thin film composed of multiple metal media is performed. The optimized structure of the thin film used for the mixed medium is clarified by comparing the reflectance and plasmon excitation intensity. The magnetic sensing application of the surface plasmon sensor is examined. Assuming a thin film structure consisting of a metal for plasmon excitation and a magnetic material, we compare the reflectance and plasmon excitation intensity when the magnetic material causes a change in the dielectric constant due to external magnetic field. Since the reflection characteristics are sensitive to the change in the dielectric constant, the structure that reacts to magnetic fields is clarified. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Magnetic sensing / Surface Plasmon Resonance / Kretschmann Arrangement / Magneto-optical effect / Finite-Difference Frequency-Domain Method / / / |
Reference Info. |
IEICE Tech. Rep., vol. 120, no. 31, EST2020-5, pp. 23-28, May 2020. |
Paper # |
EST2020-5 |
Date of Issue |
2020-05-14 (EST) |
ISSN |
Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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EST2020-5 Link to ES Tech. Rep. Archives: EST2020-5 |