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Paper Abstract and Keywords
Presentation 2020-04-13 16:50
[Invited Talk] Fabrication of MoS2 and WS2 films by chemical solution process for thin film transistors
Joonam Kim, Takahiro Nakajima, Yuki Kobayashi, Ken-ichi Haga, Eisuke Tokumitsu (JAIST)
Abstract (in Japanese) (See Japanese page) 
(in English) (Not available yet)
Keyword (in Japanese) (See Japanese page) 
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Conference Information
Committee SDM OME  
Conference Date 2020-04-13 - 2020-04-14 
Place (in Japanese) (See Japanese page) 
Place (in English) Okinawaken Seinen Kaikan 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Thin film devices (Si, compound, organic, flexible), Biotechnology, Materials, Characterization, etc. 
Paper Information
Registration To SDM 
Conference Code 2020-04-SDM-OME 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Fabrication of MoS2 and WS2 films by chemical solution process for thin film transistors 
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1st Author's Name Joonam Kim  
1st Author's Affiliation Japan Advanced Institute of Science and Technology (JAIST)
2nd Author's Name Takahiro Nakajima  
2nd Author's Affiliation Japan Advanced Institute of Science and Technology (JAIST)
3rd Author's Name Yuki Kobayashi  
3rd Author's Affiliation Japan Advanced Institute of Science and Technology (JAIST)
4th Author's Name Ken-ichi Haga  
4th Author's Affiliation Japan Advanced Institute of Science and Technology (JAIST)
5th Author's Name Eisuke Tokumitsu  
5th Author's Affiliation Japan Advanced Institute of Science and Technology (JAIST)
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Date Time 2020-04-13 16:50:00 
Presentation Time 30 minutes 
Registration for SDM 
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