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Paper Abstract and Keywords
Presentation 2020-03-04 16:25
Machine Learning Based Lithography Hotspot Detection Method and Evaluation
Hidekazu Takahashi, Shimpei Sato, Atsushi Takahashi (Tokyo Tech) VLD2019-106 HWS2019-79
Abstract (in Japanese) (See Japanese page) 
(in English) As VLSI device feature sizes are getting smaller and smaller, layout design
has become more important to keep the yield.
Machine learning based method is one of the candidates to detect layout
patterns which cause yield loss, called hotspots.
ICCAD2012 contest dataset is widely used to evaluate machine learning based
methods, however, training-set and test-set contain the identical data.
In order to evaluate these methods appropriately, it is necessary to evaluate
the ability of them by using the data that are not contained in training-set.
Original ICCAD2012 dataset does not fit to this purpose.
In practice, even minor nm-level variations of a non-hotspot could become a hotspot.
ICCAD2012 dataset include no such data.
In this paper, we re-evaluate the existing machine learning based methods using the new dataset developed recently.
Keyword (in Japanese) (See Japanese page) 
(in English) Hotspot / Dataset / Machine Learning / / / / /  
Reference Info. IEICE Tech. Rep., vol. 119, no. 443, VLD2019-106, pp. 71-76, March 2020.
Paper # VLD2019-106 
Date of Issue 2020-02-26 (VLD, HWS) 
ISSN Print edition: ISSN 0913-5685  Online edition: ISSN 2432-6380
Copyright
and
reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF VLD2019-106 HWS2019-79

Conference Information
Committee HWS VLD  
Conference Date 2020-03-04 - 2020-03-07 
Place (in Japanese) (See Japanese page) 
Place (in English) Okinawa Ken Seinen Kaikan 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Design Technology for System-on-Silicon, Hardware Security, etc. 
Paper Information
Registration To VLD 
Conference Code 2020-03-HWS-VLD 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Machine Learning Based Lithography Hotspot Detection Method and Evaluation 
Sub Title (in English)  
Keyword(1) Hotspot  
Keyword(2) Dataset  
Keyword(3) Machine Learning  
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1st Author's Name Hidekazu Takahashi  
1st Author's Affiliation Tokyo Institute of Technology (Tokyo Tech)
2nd Author's Name Shimpei Sato  
2nd Author's Affiliation Tokyo Institute of Technology (Tokyo Tech)
3rd Author's Name Atsushi Takahashi  
3rd Author's Affiliation Tokyo Institute of Technology (Tokyo Tech)
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Speaker
Date Time 2020-03-04 16:25:00 
Presentation Time 25 
Registration for VLD 
Paper # IEICE-VLD2019-106,IEICE-HWS2019-79 
Volume (vol) IEICE-119 
Number (no) no.443(VLD), no.444(HWS) 
Page pp.71-76 
#Pages IEICE-6 
Date of Issue IEICE-VLD-2020-02-26,IEICE-HWS-2020-02-26 


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