Paper Abstract and Keywords |
Presentation |
2020-01-31 16:00
Operation Principle and Structure of normally-off Floating Gate GaN HEMT with Injection Gate Nagumo Kenshi, Kimoto Daiki, Suwa Tomoyuki (Tohoku Univ.), Teramoto Akinobu (Hiroshima Univ.), Shirota Riichiro, Tskatani Shinichiro (NCTU), Kuroda Rihito, Sugawa Shigetoshi (Tohoku Univ.) ED2019-104 MW2019-138 Link to ES Tech. Rep. Archives: ED2019-104 MW2019-138 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We report a GaN HEMT (High Electron Mobility Transistor) with floating gate, that has an additional injection gate for charge injection as a structure to achieve normally-off. The introduction of the injection gate not only avoids damage to the gate insulation film at the period of charge injection, which was a problem of conventional HEMT devices with floating gate, but also suppresses threshold voltage-variation by the charge injection. We show the usefulness of this structure by circuit modeling of this new structure and structural design by numerical calculation. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
GaN / Normally-off / Floating Gate / HEMT / structural design / Injection Gate / / |
Reference Info. |
IEICE Tech. Rep., vol. 119, no. 408, ED2019-104, pp. 55-58, Jan. 2020. |
Paper # |
ED2019-104 |
Date of Issue |
2020-01-24 (ED, MW) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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ED2019-104 MW2019-138 Link to ES Tech. Rep. Archives: ED2019-104 MW2019-138 |
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