IEICE Technical Committee Submission System
Conference Paper's Information
Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top Page Go Previous   [Japanese] / [English] 

Paper Abstract and Keywords
Presentation 2020-01-28 13:00
[Invited Talk] Formation of High Reliability Hydrogen-free MONOS Cells Using Deuterated Ammonia
Masaki Noguchi, Tatsunori Isogai, Hiroyuki Yamashita, Keiichi Sawa, Ryota Fujitsuka, Takanori Yamanaka, Shunsuke Okada, Tomonori Aoyama, Fumiki Aiso, Junko Abe, Yoshiro Ogawa, Seiji Nakagawa, Hideshi Miyajima (KIOXIA) SDM2019-82 Link to ES Tech. Rep. Archives: SDM2019-82
Abstract (in Japanese) (See Japanese page) 
(in English) For high reliability non-volatile memory cell dielectrics, hydrogen-free deuterated tunnel SiON and charge-trap SiN films are demonstrated. By using deuterated ammonia (ND3) instead of ammonia (NH3) as nitridation species in ALD cycles, an ultra-high deuterium/hydrogen ratio has been successfully obtained in both films, and these films showed good endurance for program / erase stress and data retention properties in MONOS capacitors.
Keyword (in Japanese) (See Japanese page) 
(in English) Reliability / ND3 / Deuterium / Hydrogen / ALD / Data Retention / DR /  
Reference Info. IEICE Tech. Rep., vol. 119, no. 397, SDM2019-82, pp. 1-4, Jan. 2020.
Paper # SDM2019-82 
Date of Issue 2020-01-21 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF SDM2019-82 Link to ES Tech. Rep. Archives: SDM2019-82

Conference Information
Committee SDM  
Conference Date 2020-01-28 - 2020-01-28 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To SDM 
Conference Code 2020-01-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Formation of High Reliability Hydrogen-free MONOS Cells Using Deuterated Ammonia 
Sub Title (in English)  
Keyword(1) Reliability  
Keyword(2) ND3  
Keyword(3) Deuterium  
Keyword(4) Hydrogen  
Keyword(5) ALD  
Keyword(6) Data Retention  
Keyword(7) DR  
Keyword(8)  
1st Author's Name Masaki Noguchi  
1st Author's Affiliation Kioxia Corporation (KIOXIA)
2nd Author's Name Tatsunori Isogai  
2nd Author's Affiliation Kioxia Corporation (KIOXIA)
3rd Author's Name Hiroyuki Yamashita  
3rd Author's Affiliation Kioxia Corporation (KIOXIA)
4th Author's Name Keiichi Sawa  
4th Author's Affiliation Kioxia Corporation (KIOXIA)
5th Author's Name Ryota Fujitsuka  
5th Author's Affiliation Kioxia Corporation (KIOXIA)
6th Author's Name Takanori Yamanaka  
6th Author's Affiliation Kioxia Corporation (KIOXIA)
7th Author's Name Shunsuke Okada  
7th Author's Affiliation Kioxia Corporation (KIOXIA)
8th Author's Name Tomonori Aoyama  
8th Author's Affiliation Kioxia Corporation (KIOXIA)
9th Author's Name Fumiki Aiso  
9th Author's Affiliation Kioxia Corporation (KIOXIA)
10th Author's Name Junko Abe  
10th Author's Affiliation Kioxia Corporation (KIOXIA)
11th Author's Name Yoshiro Ogawa  
11th Author's Affiliation Kioxia Corporation (KIOXIA)
12th Author's Name Seiji Nakagawa  
12th Author's Affiliation Kioxia Corporation (KIOXIA)
13th Author's Name Hideshi Miyajima  
13th Author's Affiliation Kioxia Corporation (KIOXIA)
14th Author's Name  
14th Author's Affiliation ()
15th Author's Name  
15th Author's Affiliation ()
16th Author's Name  
16th Author's Affiliation ()
17th Author's Name  
17th Author's Affiliation ()
18th Author's Name  
18th Author's Affiliation ()
19th Author's Name  
19th Author's Affiliation ()
20th Author's Name  
20th Author's Affiliation ()
Speaker Author-1 
Date Time 2020-01-28 13:00:00 
Presentation Time 30 minutes 
Registration for SDM 
Paper # SDM2019-82 
Volume (vol) vol.119 
Number (no) no.397 
Page pp.1-4 
#Pages
Date of Issue 2020-01-21 (SDM) 


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan