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| Presentation | 2019-11-15 16:35 Mask Optimization Considering Process Variation by Subgradient Method Yukihide Kohira, Rina Azuma (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA)  VLD2019-53 DC2019-77 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In resolution enhancement techniques in the optical lithography, Optical Proximity Correction (OPC), which improves shape fidelity of formed patterns on wafers against designed target patterns by mask optimization, is essential to progress the optical lithography. In this paper, a mask optimization method by using Lagrangean relaxation method and subgradient method is proposed to generate masks with high tolerance against process variation. Experimental results show that the proposed method obtains masks with high shape fidelity and high tolerance against process variation in short computational times. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | optical lithography / mask optimization / Optical Proximity Correction (OPC) / subgradient method / Lagrangean relaxation method / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 119, no. 282, VLD2019-53, pp. 197-202, Nov. 2019. | |
| Paper # | VLD2019-53 | |
| Date of Issue | 2019-11-06 (VLD, DC) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | VLD2019-53 DC2019-77 |
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| Conference Information | |
| Committee | VLD DC CPSY RECONF ICD IE IPSJ-SLDM IPSJ-EMB |
| Conference Date | 2019-11-13 - 2019-11-15 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Ehime Prefecture Gender Equality Center |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Gaia 2019 -New Field of VLSI Design- |
| Paper Information | |
| Registration To | VLD |
| Conference Code | 2019-11-VLD-DC-CPSY-RECONF-ICD-IE-SLDM-EMB-ARC |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Mask Optimization Considering Process Variation by Subgradient Method |
| Sub Title (in English) | |
| Keyword(1) | optical lithography |
| Keyword(2) | mask optimization |
| Keyword(3) | Optical Proximity Correction (OPC) |
| Keyword(4) | subgradient method |
| Keyword(5) | Lagrangean relaxation method |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Yukihide Kohira |
| 1st Author's Affiliation | The University of Aizu (Univ. of Aizu) |
| 2nd Author's Name | Rina Azuma |
| 2nd Author's Affiliation | The University of Aizu (Univ. of Aizu) |
| 3rd Author's Name | Tomomi Matsui |
| 3rd Author's Affiliation | Tokyo Institute of Technology (Tokyo Tech) |
| 4th Author's Name | Atsushi Takahashi |
| 4th Author's Affiliation | Tokyo Institute of Technology (Tokyo Tech) |
| 5th Author's Name | Chikaaki Kodama |
| 5th Author's Affiliation | KIOXIA Corporation (KIOXIA) |
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| Speaker | Author-1 |
| Date Time | 2019-11-15 16:35:00 |
| Presentation Time | 25 minutes |
| Registration for | VLD |
| Paper # | VLD2019-53, DC2019-77 |
| Volume (vol) | vol.119 |
| Number (no) | no.282(VLD), no.283(DC) |
| Page | pp.197-202 |
| #Pages | 6 |
| Date of Issue | 2019-11-06 (VLD, DC) |
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