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Paper Abstract and Keywords
Presentation 2019-10-24 15:10
Resistance Measurement Platform for Statistical Evaluation of Emerging Memory Materials with High Accuracy
Takeru Maeda, Yuya Omura, Rihito Kuroda, Akinobu Teramoto, Tomoyuki Suwa, Shigetoshi Sugawa (Tohoku Univ.) SDM2019-65
Abstract (in Japanese) (See Japanese page) 
(in English) A high precision 1 Ω – 10 MΩ range resistance measurement platform is presented. The developed platform excludes on-resistance of selectors, resulting in high measurement accuracy across the measurement range of 1 Ω – 10 MΩ. The developed platform can accurately measure the resistance of various memory materials on a large scale of 360,000 cells within 50 ms. Various memory materials can be tested only by forming them on top of the platform. We can commonly use the platform regardless of memory materials. We verified the circuit operation by measuring 6,000 Poly-Si cells.
Keyword (in Japanese) (See Japanese page) 
(in English) emerging memories / resistance measurement / statistical evaluation / platform / / / /  
Reference Info. IEICE Tech. Rep., vol. 119, no. 239, SDM2019-65, pp. 59-64, Oct. 2019.
Paper # SDM2019-65 
Date of Issue 2019-10-16 (SDM) 
ISSN Print edition: ISSN 0913-5685  Online edition: ISSN 2432-6380
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF SDM2019-65

Conference Information
Committee SDM  
Conference Date 2019-10-23 - 2019-10-24 
Place (in Japanese) (See Japanese page) 
Place (in English) Niche, Tohoku Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process Science and New Process Technology 
Paper Information
Registration To SDM 
Conference Code 2019-10-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Resistance Measurement Platform for Statistical Evaluation of Emerging Memory Materials with High Accuracy 
Sub Title (in English)  
Keyword(1) emerging memories  
Keyword(2) resistance measurement  
Keyword(3) statistical evaluation  
Keyword(4) platform  
1st Author's Name Takeru Maeda  
1st Author's Affiliation Tohoku University (Tohoku Univ.)
2nd Author's Name Yuya Omura  
2nd Author's Affiliation Tohoku University (Tohoku Univ.)
3rd Author's Name Rihito Kuroda  
3rd Author's Affiliation Tohoku University (Tohoku Univ.)
4th Author's Name Akinobu Teramoto  
4th Author's Affiliation Tohoku University (Tohoku Univ.)
5th Author's Name Tomoyuki Suwa  
5th Author's Affiliation Tohoku University (Tohoku Univ.)
6th Author's Name Shigetoshi Sugawa  
6th Author's Affiliation Tohoku University (Tohoku Univ.)
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Date Time 2019-10-24 15:10:00 
Presentation Time 30 
Registration for SDM 
Paper # IEICE-SDM2019-65 
Volume (vol) IEICE-119 
Number (no) no.239 
Page pp.59-64 
#Pages IEICE-6 
Date of Issue IEICE-SDM-2019-10-16 

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