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| Presentation | 2019-10-24 13:00 [Invited Talk] Random nanostructure formation and electric readout for nano-artifact metrics Seiya Kasai, Renpeng Lu, Katsumi Shimizu, Xiang Yin (Hokkaido Univ.), Yosuke Ueba, Mikio Ishikawa, Mitsuru Kitamura (DNP), Morihisa Hoga (AIST), Makoto Naruse (Univ. of Tokyo), Tsutomu Matsumoto (YNU)  SDM2019-62 Link to ES Tech. Rep. Archives: SDM2019-62 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | We introduce a basic concept of nano-artifact metrics, expected to be a highly secure authentication technique using nano-scale random structures. Recent development of the basic technologies for the nano-artifact metrics including formation of two-dimensional random nanostructure using a resist collapse and a novel electric readout of the formed nanostructures. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Artifact metrics / Random nanostructure / Resist collapse / Electric readout / Si MOSFET / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 119, no. 239, SDM2019-62, pp. 45-50, Oct. 2019. | |
| Paper # | SDM2019-62 | |
| Date of Issue | 2019-10-16 (SDM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | SDM2019-62 Link to ES Tech. Rep. Archives: SDM2019-62 |
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| Conference Information | |
| Committee | SDM |
| Conference Date | 2019-10-23 - 2019-10-24 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Niche, Tohoku Univ. |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Process Science and New Process Technology |
| Paper Information | |
| Registration To | SDM |
| Conference Code | 2019-10-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Random nanostructure formation and electric readout for nano-artifact metrics |
| Sub Title (in English) | |
| Keyword(1) | Artifact metrics |
| Keyword(2) | Random nanostructure |
| Keyword(3) | Resist collapse |
| Keyword(4) | Electric readout |
| Keyword(5) | Si MOSFET |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Seiya Kasai |
| 1st Author's Affiliation | Hokkaido University (Hokkaido Univ.) |
| 2nd Author's Name | Renpeng Lu |
| 2nd Author's Affiliation | Hokkaido University (Hokkaido Univ.) |
| 3rd Author's Name | Katsumi Shimizu |
| 3rd Author's Affiliation | Hokkaido University (Hokkaido Univ.) |
| 4th Author's Name | Xiang Yin |
| 4th Author's Affiliation | Hokkaido University (Hokkaido Univ.) |
| 5th Author's Name | Yosuke Ueba |
| 5th Author's Affiliation | Dai Nippon Printing (DNP) |
| 6th Author's Name | Mikio Ishikawa |
| 6th Author's Affiliation | Dai Nippon Printing (DNP) |
| 7th Author's Name | Mitsuru Kitamura |
| 7th Author's Affiliation | Dai Nippon Printing (DNP) |
| 8th Author's Name | Morihisa Hoga |
| 8th Author's Affiliation | National Institute of Advanced Industrial Science and Technology (AIST) |
| 9th Author's Name | Makoto Naruse |
| 9th Author's Affiliation | The University of Tokyo (Univ. of Tokyo) |
| 10th Author's Name | Tsutomu Matsumoto |
| 10th Author's Affiliation | Yokohama National University (YNU) |
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| Speaker | Author-1 |
| Date Time | 2019-10-24 13:00:00 |
| Presentation Time | 50 minutes |
| Registration for | SDM |
| Paper # | SDM2019-62 |
| Volume (vol) | vol.119 |
| Number (no) | no.239 |
| Page | pp.45-50 |
| #Pages | 6 |
| Date of Issue | 2019-10-16 (SDM) |
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