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| Presentation | 2019-08-26 14:20 Preparation of conductive oxide sintered targets for AZO thin films deposited by sputtering method Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Koutaro Nagata (Niigata Univ.)  CPM2019-39 Link to ES Tech. Rep. Archives: CPM2019-39 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | In this study, AZO conductive oxide sintered bodies with 2wt.% Al2O3 added to ZnO were prepared at sintering temperature of 1500 ℃ and 1600 ℃. And deposition of AZO films was attempted by the conventional DC-magnetron sputtering method using these sintered bodies as targets. As a result, all of deposited films had a transmittance more than 80% with visible light region. The film deposited at a substrate temperature of 200℃ using a target with a sintering temperature of 1600℃ had about 8×10-4 Ω・cm. But, an AZO film with a resistivity less than 7×10-4 Ω・cm was not obtained in this study. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | AZO / Sintered body / Thin film / Magnetron sputtering / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 119, no. 181, CPM2019-39, pp. 9-12, Aug. 2019. | |
| Paper # | CPM2019-39 | |
| Date of Issue | 2019-08-19 (CPM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | CPM2019-39 Link to ES Tech. Rep. Archives: CPM2019-39 |
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| Conference Information | |
| Committee | CPM |
| Conference Date | 2019-08-26 - 2019-08-26 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Kitami Institute of Technology |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Component Parts and Materials, etc. |
| Paper Information | |
| Registration To | CPM |
| Conference Code | 2019-08-CPM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Preparation of conductive oxide sintered targets for AZO thin films deposited by sputtering method |
| Sub Title (in English) | |
| Keyword(1) | AZO |
| Keyword(2) | Sintered body |
| Keyword(3) | Thin film |
| Keyword(4) | Magnetron sputtering |
| Keyword(5) | |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Hidehiko Shimizu |
| 1st Author's Affiliation | Niigata University (Niigata Univ.) |
| 2nd Author's Name | Haruo Iwano |
| 2nd Author's Affiliation | Niigata University (Niigata Univ.) |
| 3rd Author's Name | Takahiro Kawakami |
| 3rd Author's Affiliation | Niigata University (Niigata Univ.) |
| 4th Author's Name | Yasuo Fukushima |
| 4th Author's Affiliation | Niigata University (Niigata Univ.) |
| 5th Author's Name | Koutaro Nagata |
| 5th Author's Affiliation | Niigata University (Niigata Univ.) |
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| Speaker | Author-1 |
| Date Time | 2019-08-26 14:20:00 |
| Presentation Time | 25 minutes |
| Registration for | CPM |
| Paper # | CPM2019-39 |
| Volume (vol) | vol.119 |
| Number (no) | no.181 |
| Page | pp.9-12 |
| #Pages | 4 |
| Date of Issue | 2019-08-19 (CPM) |
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