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| Presentation | 2019-01-17 11:40 A study of deep dry etching for Photonic Crystal CirD Laser Li Zeng, Shun Mizoguchi, Xiuyu Zhang, Kento Takeuchi, Hirotake Kajii, Masato Morifuji, Akihiro Maruta, Masahiko Kondow (Osaka Univ.)  PN2018-35 EMT2018-69 OPE2018-144 LQE2018-154 EST2018-82 MWP2018-53 Link to ES Tech. Rep. Archives: EMT2018-69 OPE2018-144 LQE2018-154 EST2018-82 MWP2018-53 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | In order to fabricate a photonic crystal laser with circular defect (CirD) resonator, we study deep dry etching of GaAs /AlGaAs epitaxial multilayers including InAs quantum dots using a resist mask. The etching is performed by inductively coupled plasma reactive ion etching using a mixture of Cl2，BCl3 and CH4 gases. When etching time is increased to fabricate deep air holes, the resist mask is completely etched and the surface is damaged. Therefore, we stack the resist layers on epi-wafer by twice spin-coating and enable deeper dry etching without damage. As a result, fabrication of air holes with a depth of 1.5μm becomes possible. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Photonic crystal / Dry etching / InAs quantum dot / GaAs / AlGaAs / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 118, no. 399, LQE2018-154, pp. 23-26, Jan. 2019. | |
| Paper # | LQE2018-154 | |
| Date of Issue | 2019-01-10 (PN, EMT, OPE, LQE, EST, MWP) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | PN2018-35 EMT2018-69 OPE2018-144 LQE2018-154 EST2018-82 MWP2018-53 Link to ES Tech. Rep. Archives: EMT2018-69 OPE2018-144 LQE2018-154 EST2018-82 MWP2018-53 |
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| Conference Information | |
| Committee | PN EMT OPE EST MWP LQE IEE-EMT |
| Conference Date | 2019-01-17 - 2019-01-18 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Osaka University Nakanoshima Center |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | LQE |
| Conference Code | 2019-01-PN-EMT-OPE-EST-MWP-LQE-EMT |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | A study of deep dry etching for Photonic Crystal CirD Laser |
| Sub Title (in English) | |
| Keyword(1) | Photonic crystal |
| Keyword(2) | Dry etching |
| Keyword(3) | InAs quantum dot |
| Keyword(4) | GaAs |
| Keyword(5) | AlGaAs |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Li Zeng |
| 1st Author's Affiliation | Osaka University (Osaka Univ.) |
| 2nd Author's Name | Shun Mizoguchi |
| 2nd Author's Affiliation | Osaka University (Osaka Univ.) |
| 3rd Author's Name | Xiuyu Zhang |
| 3rd Author's Affiliation | Osaka University (Osaka Univ.) |
| 4th Author's Name | Kento Takeuchi |
| 4th Author's Affiliation | Osaka University (Osaka Univ.) |
| 5th Author's Name | Hirotake Kajii |
| 5th Author's Affiliation | Osaka University (Osaka Univ.) |
| 6th Author's Name | Masato Morifuji |
| 6th Author's Affiliation | Osaka University (Osaka Univ.) |
| 7th Author's Name | Akihiro Maruta |
| 7th Author's Affiliation | Osaka University (Osaka Univ.) |
| 8th Author's Name | Masahiko Kondow |
| 8th Author's Affiliation | Osaka University (Osaka Univ.) |
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| Speaker | Author-1 |
| Date Time | 2019-01-17 11:40:00 |
| Presentation Time | 25 minutes |
| Registration for | LQE |
| Paper # | PN2018-35, EMT2018-69, OPE2018-144, LQE2018-154, EST2018-82, MWP2018-53 |
| Volume (vol) | vol.118 |
| Number (no) | no.396(PN), no.397(EMT), no.398(OPE), no.399(LQE), no.400(EST), no.401(MWP) |
| Page | pp.23-26 |
| #Pages | 4 |
| Date of Issue | 2019-01-10 (PN, EMT, OPE, LQE, EST, MWP) |
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