Paper Abstract and Keywords |
Presentation |
2018-12-07 14:10
Process Variation-aware Model-based OPC using 0-1 Quadratic Programming Rina Azuma, Yukihide Kohira (Univ. of Aizu), Tomomi Matsui, Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama, Shigeki Nojima (TMC) VLD2018-70 DC2018-56 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
Due to continuous shrinking of Critical Dimensions (CD) of layout pattern in VLSI, advances of manufacturing process in optical lithography are required. As a main stream among resolution enhancement techniques, Optical Proximity Correction (OPC), which improves shape fidelity of formed patterns on wafers against designed target patterns by mask correction, is essential to achieve scale down of CD in the optical lithography. In general, mask correction methods in OPC are classified into two classes: rule-based OPC and model-based OPC. Recently, model-based OPC is broadly studied. In this paper, we propose a model-based OPC which formulates the maximization of contrast of intensity around edges of target patterns as 0-1 Quadratic Programming, and which is solved by using Forcing Rule, Gradient Midpoint Method or Gradient Deciding Method. By these proposed methods, shape fidelity and tolerance against process variation are improved simultaneously. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
lithography / lithography simulation / optical proximity correction (OPC) / design for manufacturability (DFM) / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 118, no. 334, VLD2018-70, pp. 209-214, Dec. 2018. |
Paper # |
VLD2018-70 |
Date of Issue |
2018-11-28 (VLD, DC) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
VLD2018-70 DC2018-56 |
|