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Paper Abstract and Keywords
Presentation 2018-12-05 14:40
Improved Routing Method for Two Layer Self-Aligned Double Patterning
Shoya Tamura, Kunihiro Fujiyoshi (TUAT) VLD2018-45 DC2018-31
Abstract (in Japanese) (See Japanese page) 
(in English) Self-Aligned Double Patterning (SADP) enables us to fabricate fine wiring under ArF immersion lithography. However, when multi-layer routing is performed, vias have to be greatly thickened because techniques for manufacturing fine vias are immature. Therefore, we extended the channel routing method which can wire efficiently on the basis of the VH routing, and proposed a two-layer routing method corresponding to a significantly thick vias. In this method, x-coordinate of each via is determined by using the constraint graph so that the whole routing can be succeeded with a higher probability. We implemented the proposed method on a computer and confirmed its effectiveness.
Keyword (in Japanese) (See Japanese page) 
(in English) Self-Aligned Double Patterning / VH Routing / Channel Routing / / / / /  
Reference Info. IEICE Tech. Rep., vol. 118, no. 334, VLD2018-45, pp. 37-42, Dec. 2018.
Paper # VLD2018-45 
Date of Issue 2018-11-28 (VLD, DC) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF VLD2018-45 DC2018-31

Conference Information
Committee VLD DC CPSY RECONF CPM ICD IE IPSJ-SLDM 
Conference Date 2018-12-05 - 2018-12-07 
Place (in Japanese) (See Japanese page) 
Place (in English) Satellite Campus Hiroshima 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Design Gaia 2018 -New Field of VLSI Design- 
Paper Information
Registration To VLD 
Conference Code 2018-12-VLD-DC-CPSY-RECONF-CPM-ICD-IE-SLDM-EMB-ARC 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Improved Routing Method for Two Layer Self-Aligned Double Patterning 
Sub Title (in English)  
Keyword(1) Self-Aligned Double Patterning  
Keyword(2) VH Routing  
Keyword(3) Channel Routing  
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1st Author's Name Shoya Tamura  
1st Author's Affiliation Tokyo University of Agriculture and Technology (TUAT)
2nd Author's Name Kunihiro Fujiyoshi  
2nd Author's Affiliation Tokyo University of Agriculture and Technology (TUAT)
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Speaker Author-1 
Date Time 2018-12-05 14:40:00 
Presentation Time 25 minutes 
Registration for VLD 
Paper # VLD2018-45, DC2018-31 
Volume (vol) vol.118 
Number (no) no.334(VLD), no.335(DC) 
Page pp.37-42 
#Pages
Date of Issue 2018-11-28 (VLD, DC) 


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