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| Presentation | 2018-11-30 09:50 Chemical Bath Deposition of Undoped and Li Doped CuO Films and Thier Structural and Electrical Properties Hideyuki Okada, Tomoaki Terasako, Kenji Gochoh, Naoya Hayashimoto (Ehime Univ.)  ED2018-43 CPM2018-77 LQE2018-97 Link to ES Tech. Rep. Archives: ED2018-43 CPM2018-77 LQE2018-97 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | Undoped and Li-doped CuO films were grown on Au seed layers by chemical bath deposition (CBD) using the mixed aqueous solutions of Cu(NO3)2・3H2O and LiNO3. Surfaces of the undoped and Li-doped films were covered with the randomly distributed needle-like nanostructures, and their cross sections were composed of the plate-like grains. For the undoped films, the increase in the grain size of the Au seed layer resulted in the increase in the average grain size of the needle-like nanostructures and the decrease in the resistivity. However, both the grain size of the needle-like nanostructure and resistivity were independent of the concentration of the CBD solution. For the Li doped films, the average grain size of the needle-like nanostructures increased with increasing the LiNO3 concentration in the CBD solution. Minimum resistivity values of the Li doped films were achieved in the LiNO3 concentration range from 3 to 5 μM. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | CuO / Chemical Bath Deposition / Seed Layer / X-ray Diffraction / Scanning Electron Microscope / Resistivity / / | |
| Reference Info. | IEICE Tech. Rep., vol. 118, no. 331, CPM2018-77, pp. 49-54, Nov. 2018. | |
| Paper # | CPM2018-77 | |
| Date of Issue | 2018-11-22 (ED, CPM, LQE) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | ED2018-43 CPM2018-77 LQE2018-97 Link to ES Tech. Rep. Archives: ED2018-43 CPM2018-77 LQE2018-97 |
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| Conference Information | |
| Committee | ED LQE CPM |
| Conference Date | 2018-11-29 - 2018-11-30 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Nagoya Inst. tech. |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Nitride Semiconductor Devices, Materials, Related Technologies |
| Paper Information | |
| Registration To | CPM |
| Conference Code | 2018-11-ED-LQE-CPM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Chemical Bath Deposition of Undoped and Li Doped CuO Films and Thier Structural and Electrical Properties |
| Sub Title (in English) | |
| Keyword(1) | CuO |
| Keyword(2) | Chemical Bath Deposition |
| Keyword(3) | Seed Layer |
| Keyword(4) | X-ray Diffraction |
| Keyword(5) | Scanning Electron Microscope |
| Keyword(6) | Resistivity |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Hideyuki Okada |
| 1st Author's Affiliation | Ehime University (Ehime Univ.) |
| 2nd Author's Name | Tomoaki Terasako |
| 2nd Author's Affiliation | Ehime University (Ehime Univ.) |
| 3rd Author's Name | Kenji Gochoh |
| 3rd Author's Affiliation | Ehime University (Ehime Univ.) |
| 4th Author's Name | Naoya Hayashimoto |
| 4th Author's Affiliation | Ehime University (Ehime Univ.) |
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| Speaker | Author-2 |
| Date Time | 2018-11-30 09:50:00 |
| Presentation Time | 25 minutes |
| Registration for | CPM |
| Paper # | ED2018-43, CPM2018-77, LQE2018-97 |
| Volume (vol) | vol.118 |
| Number (no) | no.330(ED), no.331(CPM), no.332(LQE) |
| Page | pp.49-54 |
| #Pages | 6 |
| Date of Issue | 2018-11-22 (ED, CPM, LQE) |
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