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| Presentation | 2018-05-16 15:50 Pixel-based OPC using Quadratic Programming for Mask Optimization Rina Azuma, Yukihide Kohira (Univ. of Aizu)  VLD2018-3 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | Due to continuous shrinking of Critical Dimensions (CD) in semiconductor manufacturing, advance of process technology in optical lithography is required. As a main stream among resolution enhance techniques to improve resolution, Optical Proximity Correction (OPC), which raises shape fidelity of formed patterns on wafers by mask correction to designed patterns, is essential to achieve scale down of CD in the optical lithography. In general, methods of mask correction by OPC are divided into two classes: rule-based OPC and model-based OPC. Recently, model-based OPC is broadly studied. Moreover, pixel-base OPC, which is one of model-base OPCs, decides opening or shielding part for each pixel in the mask and forms entire mask shape by mathematical models. This pixel-base OPC is known that it outputs very complicated mask geometry. In this paper, we propose process variation-aware pixel-based OPC which maximizes contrast of intensity around edges of target patterns by using Quadratic Programming. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | lithography / lithography simulation / optical proximity correction (OPC) / design for manufacturability (DFM) / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 118, no. 29, VLD2018-3, pp. 31-36, May 2018. | |
| Paper # | VLD2018-3 | |
| Date of Issue | 2018-05-09 (VLD) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | VLD2018-3 |
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| Conference Information | |
| Committee | VLD IPSJ-SLDM |
| Conference Date | 2018-05-16 - 2018-05-16 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Kitakyushu International Conference Center |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | System Design, etc. |
| Paper Information | |
| Registration To | VLD |
| Conference Code | 2018-05-VLD-SLDM |
| Language | English (Japanese title is available) |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Pixel-based OPC using Quadratic Programming for Mask Optimization |
| Sub Title (in English) | |
| Keyword(1) | lithography |
| Keyword(2) | lithography simulation |
| Keyword(3) | optical proximity correction (OPC) |
| Keyword(4) | design for manufacturability (DFM) |
| Keyword(5) | |
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| Keyword(8) | |
| 1st Author's Name | Rina Azuma |
| 1st Author's Affiliation | The University of Aizu (Univ. of Aizu) |
| 2nd Author's Name | Yukihide Kohira |
| 2nd Author's Affiliation | The University of Aizu (Univ. of Aizu) |
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| Speaker | Author-1 |
| Date Time | 2018-05-16 15:50:00 |
| Presentation Time | 25 minutes |
| Registration for | VLD |
| Paper # | VLD2018-3 |
| Volume (vol) | vol.118 |
| Number (no) | no.29 |
| Page | pp.31-36 |
| #Pages | 6 |
| Date of Issue | 2018-05-09 (VLD) |
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