Paper Abstract and Keywords |
Presentation |
2017-08-09 15:25
Large area uniform processing characterization using synchrotron radiation deep X-ray lithography system (BL11) Masaya Takeuchi, Akinobu Yamaguchi, Utsumi Yuichi (Univ. of Hyogo) ED2017-29 Link to ES Tech. Rep. Archives: ED2017-29 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
We developed new deep X-ray lithography system (BL11) to fabricate high aspect ratio three-dimensional microstructure at the “NewSUBARU” synchrotron radiation facility. In this study, beam scan method to expose sample with uniform intensity distribution in large area was considered and processing characteristics of resist (PMMA) was evaluated. As a result, uniform processing depth of deviation of a few percent or less was obtained. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
LIGA process / Deep x-ray lithography / Dynchrotron radiation / Microfabrication / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 117, no. 172, ED2017-29, pp. 17-18, Aug. 2017. |
Paper # |
ED2017-29 |
Date of Issue |
2017-08-02 (ED) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
ED2017-29 Link to ES Tech. Rep. Archives: ED2017-29 |
Conference Information |
Committee |
ED |
Conference Date |
2017-08-09 - 2017-08-10 |
Place (in Japanese) |
(See Japanese page) |
Place (in English) |
Kikai-Shinko-Kaikan Bldg. |
Topics (in Japanese) |
(See Japanese page) |
Topics (in English) |
Sensor, MEMS, general |
Paper Information |
Registration To |
ED |
Conference Code |
2017-08-ED |
Language |
Japanese |
Title (in Japanese) |
(See Japanese page) |
Sub Title (in Japanese) |
(See Japanese page) |
Title (in English) |
Large area uniform processing characterization using synchrotron radiation deep X-ray lithography system (BL11) |
Sub Title (in English) |
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Keyword(1) |
LIGA process |
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Deep x-ray lithography |
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Dynchrotron radiation |
Keyword(4) |
Microfabrication |
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1st Author's Name |
Masaya Takeuchi |
1st Author's Affiliation |
University of Hyogo (Univ. of Hyogo) |
2nd Author's Name |
Akinobu Yamaguchi |
2nd Author's Affiliation |
University of Hyogo (Univ. of Hyogo) |
3rd Author's Name |
Utsumi Yuichi |
3rd Author's Affiliation |
University of Hyogo (Univ. of Hyogo) |
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Speaker |
Author-1 |
Date Time |
2017-08-09 15:25:00 |
Presentation Time |
25 minutes |
Registration for |
ED |
Paper # |
ED2017-29 |
Volume (vol) |
vol.117 |
Number (no) |
no.172 |
Page |
pp.17-18 |
#Pages |
2 |
Date of Issue |
2017-08-02 (ED) |
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