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| Presentation | 2017-07-22 11:33 [Invited Talk] Development of Low Damage Facing Target Sputter-deposition Processes Yoichi Hoshi (Tokyo Polytechnic Univ.)  CPM2017-38 Link to ES Tech. Rep. Archives: CPM2017-38 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | About 43 years ago, I firstly challenged the deposition of YIG films by using a conventional sputtering system. Deposition of stoichiometric YIG films was a difficult challenge since high energy negative oxygen ions and secondary electrons emitted from target surface bombard the substrate surface during deposition. In order to realize high rate sputter-deposition of YIG film, I studied sputtering phenomena and invented Facing-Target sputtering method in which substrate bombardment of negative oxygen ions and secondary electrons were completely suppressed. Recently, low damage sputter-deposition process using the Facing-Target sputtering method has been developed for organic devices. In this paper, history of the low damage sputter-deposition process for the formation of top electrode films in OLED will be explained. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Facing-Traget sputtering / negative oxygen ion / secondary electron / OLED / / low damage sputtering / / | |
| Reference Info. | IEICE Tech. Rep., vol. 117, no. 148, CPM2017-38, pp. 89-94, July 2017. | |
| Paper # | CPM2017-38 | |
| Date of Issue | 2017-07-14 (CPM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | CPM2017-38 Link to ES Tech. Rep. Archives: CPM2017-38 |
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| Conference Information | |
| Committee | CPM |
| Conference Date | 2017-07-21 - 2017-07-22 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | CPM |
| Conference Code | 2017-07-CPM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Development of Low Damage Facing Target Sputter-deposition Processes |
| Sub Title (in English) | |
| Keyword(1) | Facing-Traget sputtering |
| Keyword(2) | negative oxygen ion |
| Keyword(3) | secondary electron |
| Keyword(4) | OLED |
| Keyword(5) | |
| Keyword(6) | low damage sputtering |
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| Keyword(8) | |
| 1st Author's Name | Yoichi Hoshi |
| 1st Author's Affiliation | Tokyo Polytechnic University (Tokyo Polytechnic Univ.) |
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| Speaker | Author-1 |
| Date Time | 2017-07-22 11:33:00 |
| Presentation Time | 40 minutes |
| Registration for | CPM |
| Paper # | CPM2017-38 |
| Volume (vol) | vol.117 |
| Number (no) | no.148 |
| Page | pp.89-94 |
| #Pages | 6 |
| Date of Issue | 2017-07-14 (CPM) |
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