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Paper Abstract and Keywords
Presentation 2017-03-02 11:20
Efficient Local Pattern Modification Method using FM Algorithm in LELE Double Patterning
Atsushi Ogashira, Shimpei Sato, Atsushi Takahashi (Tokyo TECH)
Abstract (in Japanese) (See Japanese page) 
(in English) In current semiconductor design, high quality and short time design is required.
In an advanced lithography technology in recent years, even in a pattern that satisfies design rule may contain spot that degrades the yield which is called hot spot.
Therefore, it is required to obtain a pattern without a hot spot in a short time and to
converge the design.
However, the time required for lithography simulation for checking the existence of hot spots
is long, and a new hot spot may be generated by pattern modification for eliminating hot spots.
Therefore, in this research, we propose a method to obtain a pattern modification with short simulation time required after modification, while suppressing the occurrence of new hot spots by modification.
By using a pattern modification obtained by the method, it is expected that the design can be converged in a short time and an efficient semiconductor design can be achieved.
Keyword (in Japanese) (See Japanese page) 
(in English) pattern modification / hot spot / double patterning / / / / /  
Reference Info. IEICE Tech. Rep., vol. 116, no. 478, VLD2016-113, pp. 67-72, March 2017.
Paper # VLD2016-113 
Date of Issue 2017-02-22 (VLD) 
ISSN Print edition: ISSN 0913-5685  Online edition: ISSN 2432-6380

Conference Information
Committee VLD  
Conference Date 2017-03-01 - 2017-03-03 
Place (in Japanese) (See Japanese page) 
Place (in English) Okinawa Seinen Kaikan 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To VLD 
Conference Code 2017-03-VLD 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Efficient Local Pattern Modification Method using FM Algorithm in LELE Double Patterning 
Sub Title (in English)  
Keyword(1) pattern modification  
Keyword(2) hot spot  
Keyword(3) double patterning  
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1st Author's Name Atsushi Ogashira  
1st Author's Affiliation Tokyo Institute of Technology (Tokyo TECH)
2nd Author's Name Shimpei Sato  
2nd Author's Affiliation Tokyo Institute of Technology (Tokyo TECH)
3rd Author's Name Atsushi Takahashi  
3rd Author's Affiliation Tokyo Institute of Technology (Tokyo TECH)
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Speaker
Date Time 2017-03-02 11:20:00 
Presentation Time 25 
Registration for VLD 
Paper # IEICE-VLD2016-113 
Volume (vol) IEICE-116 
Number (no) no.478 
Page pp.67-72 
#Pages IEICE-6 
Date of Issue IEICE-VLD-2017-02-22 


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