Paper Abstract and Keywords |
Presentation |
2016-10-26 14:50
Formation technology of Flat Surface after Selective Epitaxial Growth on Ion-Implanted (100) Oriented Thin SOI Wafers Kiichi Furukawa, Akinobu Teramoto, Rihito Kuroda, Tomoyuki Suwa, Keiichi Hashimoto, Shigetoshi Sugawa (Tohoku Univ.), Daisuke Suzuki, Yoichiro Chiba, Katsutoshi Ishii, Akira Shimizu, Kazuhide Hasebe (Tokyo Electron Tohoku) SDM2016-70 Link to ES Tech. Rep. Archives: SDM2016-70 |
Abstract |
(in Japanese) |
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(in English) |
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Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
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Reference Info. |
IEICE Tech. Rep., vol. 116, no. 270, SDM2016-70, pp. 9-14, Oct. 2016. |
Paper # |
SDM2016-70 |
Date of Issue |
2016-10-19 (SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
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SDM2016-70 Link to ES Tech. Rep. Archives: SDM2016-70 |