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Paper Abstract and Keywords
Presentation 2016-04-14 13:00
[Invited Lecture] Visualization of Filament of ReRAM during Resistive Switching by in-situ Transmission Electron Microscopy
Yasuo Takahashi (Hokkaido Univ.), Masaki Kudo (Kyusyu Univ.), Masashi Arita (Hokkaido Univ.) ICD2016-5 Link to ES Tech. Rep. Archives: ICD2016-5
Abstract (in Japanese) (See Japanese page) 
(in English) Resistive random access memories (ReRAMs) have been investigated as a next generation non-volatile memory, where 16-Gbit cells have been demonstrated. It is important to understand the switching mechanism of ReRAMs in order to in order to guarantee the reliability. Here, in-situ transmission electron microscopy (TEM), in which high-resolution TEM image observation is carried out during the electrical measurements, is applied to analysis of the 30-nm Cu-Te-based ReRAM operation. Switching characteristics, which are almost the same as those measured at the outside of TEM by the use of conventional ReRAM cells, are achieved together with clear images of formation and rupture of conductive filaments corresponding to the low and high resistance states. In addition, retention characteristics longer than 106 s, and SET/RESET pulse operation more than 100k times are confirmed during TEM observation. These results indicate that the in-situ TEM will be a powerful tool to analyze the reliability of ReRAMs and to find out the origin of the failures.
Keyword (in Japanese) (See Japanese page) 
(in English) in-situ transmission electron microscopy / Resistive random access memory / in-situ TEM / ReRAM / CBRAM / reliability / /  
Reference Info. IEICE Tech. Rep., vol. 116, no. 3, ICD2016-5, pp. 21-26, April 2016.
Paper # ICD2016-5 
Date of Issue 2016-04-07 (ICD) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee ICD  
Conference Date 2016-04-14 - 2016-04-15 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To ICD 
Conference Code 2016-04-ICD 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Visualization of Filament of ReRAM during Resistive Switching by in-situ Transmission Electron Microscopy 
Sub Title (in English)  
Keyword(1) in-situ transmission electron microscopy  
Keyword(2) Resistive random access memory  
Keyword(3) in-situ TEM  
Keyword(4) ReRAM  
Keyword(5) CBRAM  
Keyword(6) reliability  
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Keyword(8)  
1st Author's Name Yasuo Takahashi  
1st Author's Affiliation Hokkaido University (Hokkaido Univ.)
2nd Author's Name Masaki Kudo  
2nd Author's Affiliation Kyusyu University (Kyusyu Univ.)
3rd Author's Name Masashi Arita  
3rd Author's Affiliation Hokkaido University (Hokkaido Univ.)
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Date Time 2016-04-14 13:00:00 
Presentation Time 25 minutes 
Registration for ICD 
Paper # ICD2016-5 
Volume (vol) vol.116 
Number (no) no.3 
Page pp.21-26 
#Pages
Date of Issue 2016-04-07 (ICD) 


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