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Paper Abstract and Keywords
Presentation 2016-04-08 16:00
Non-thermal energy utilized low temperature solid phase crystallization of amorphous Ge on SiO2 substrate
Kinta Kusano, Kazuki Kudo, Kodai Tomouchi, Taisei Sakaguchi, Kenta Moto (NIT, Kumamoto), Shinichi Motoyama, Yutaka Kusuda, Masahiro Furuta (SAMCO), Nobuyuki Naka, Tomoko Numata (HORIBA), Kenichiro Takakura, Isao Tsunoda (NIT, Kumamoto) SDM2016-8 OME2016-8 Link to ES Tech. Rep. Archives: SDM2016-8 OME2016-8
Abstract (in Japanese) (See Japanese page) 
(in English) We have investigated the low-temperature SPC of amorphous Ge on insulating substrate. High temperature and long time annealing are necessary to obtain the crystalline Ge on insulating substrate by conventional SPC method. In order to enhance the crystal nucleation, the initial amorphicity modulation induced by electron irradiation was carried out. The incubation time for crystal nucleation was decreased to 1/50 of that without electron irradiation. Furthermore, the compressive stress stimulated MIC of amorphous Ge on insulating substrate has examined. As a result, the solid phase crystallization of amorphous Ge was significantly enhanced (~ 1000 times). In addition, the crystallization temperature can be decreased to 120 oC. In this way, low temperature crystallization below the softening temperature of low cost plastic substrate (150 oC) becomes possible.
Keyword (in Japanese) (See Japanese page) 
(in English) Germanium / Solid phase crystallization / Metal induced crystallization / Electron beam irradiation / Compressive stress stimulation / / /  
Reference Info. IEICE Tech. Rep., vol. 116, no. 1, SDM2016-8, pp. 31-34, April 2016.
Paper # SDM2016-8 
Date of Issue 2016-04-01 (SDM, OME) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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Conference Information
Committee SDM OME  
Conference Date 2016-04-08 - 2016-04-09 
Place (in Japanese) (See Japanese page) 
Place (in English) Okinawa Prefectural Museum & Art Museum 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Thin film devices, etc 
Paper Information
Registration To SDM 
Conference Code 2016-04-SDM-OME 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Non-thermal energy utilized low temperature solid phase crystallization of amorphous Ge on SiO2 substrate 
Sub Title (in English)  
Keyword(1) Germanium  
Keyword(2) Solid phase crystallization  
Keyword(3) Metal induced crystallization  
Keyword(4) Electron beam irradiation  
Keyword(5) Compressive stress stimulation  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Kinta Kusano  
1st Author's Affiliation National Institute of Technology, Kumamoto College (NIT, Kumamoto)
2nd Author's Name Kazuki Kudo  
2nd Author's Affiliation National Institute of Technology, Kumamoto College (NIT, Kumamoto)
3rd Author's Name Kodai Tomouchi  
3rd Author's Affiliation National Institute of Technology, Kumamoto College (NIT, Kumamoto)
4th Author's Name Taisei Sakaguchi  
4th Author's Affiliation National Institute of Technology, Kumamoto College (NIT, Kumamoto)
5th Author's Name Kenta Moto  
5th Author's Affiliation National Institute of Technology, Kumamoto College (NIT, Kumamoto)
6th Author's Name Shinichi Motoyama  
6th Author's Affiliation SAMCO (SAMCO)
7th Author's Name Yutaka Kusuda  
7th Author's Affiliation SAMCO (SAMCO)
8th Author's Name Masahiro Furuta  
8th Author's Affiliation SAMCO (SAMCO)
9th Author's Name Nobuyuki Naka  
9th Author's Affiliation HORIBA (HORIBA)
10th Author's Name Tomoko Numata  
10th Author's Affiliation HORIBA (HORIBA)
11th Author's Name Kenichiro Takakura  
11th Author's Affiliation National Institute of Technology, Kumamoto College (NIT, Kumamoto)
12th Author's Name Isao Tsunoda  
12th Author's Affiliation National Institute of Technology, Kumamoto College (NIT, Kumamoto)
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Speaker Author-1 
Date Time 2016-04-08 16:00:00 
Presentation Time 25 minutes 
Registration for SDM 
Paper # SDM2016-8, OME2016-8 
Volume (vol) vol.116 
Number (no) no.1(SDM), no.2(OME) 
Page pp.31-34 
#Pages
Date of Issue 2016-04-01 (SDM, OME) 


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