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| Presentation | 2015-10-30 14:30 Low Work Function LaB6 Thin Films Prepared by Nitrogen Doped LaB6 Target Sputtering Hidekazu Ishii (Tohoku Univ), Takahashi Kentarou (Sumitomo Osaka Cement), Tetsuya Goto, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ)  SDM2015-81 Link to ES Tech. Rep. Archives: SDM2015-81 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | LaB6 thin films were deposited by magnetron sputtering, and their work function was investigated. It was found that the work function depends greatly on the nitrogen and the oxygen concentrations in the LaB6 sputtering target. Low work function of 2.4 eV was obtained when the nitrogen concentration was approximately 0.4% and the oxygen concentration was controlled below 1%. In this condition, the Hall measurement results revealed that the sputtered LaB6 film exhibited both the highest electron mobility (1.5 cm2/Vs) and the highest electron density (3.3×1022 cm-3). This suggested that orderliness between atoms was improved at this condition, resulting in the realization of low work function. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | LaB6 / Sputtering deposition / Work Function / Lanthanum Hexaboride / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 115, no. 280, SDM2015-81, pp. 53-56, Oct. 2015. | |
| Paper # | SDM2015-81 | |
| Date of Issue | 2015-10-22 (SDM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | SDM2015-81 Link to ES Tech. Rep. Archives: SDM2015-81 |
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| Conference Information | |
| Committee | SDM |
| Conference Date | 2015-10-29 - 2015-10-30 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Niche, Tohoku Univ. |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Process Science and New Process Technology |
| Paper Information | |
| Registration To | SDM |
| Conference Code | 2015-10-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Low Work Function LaB6 Thin Films Prepared by Nitrogen Doped LaB6 Target Sputtering |
| Sub Title (in English) | |
| Keyword(1) | LaB6 |
| Keyword(2) | Sputtering deposition |
| Keyword(3) | Work Function |
| Keyword(4) | Lanthanum Hexaboride |
| Keyword(5) | |
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| Keyword(8) | |
| 1st Author's Name | Hidekazu Ishii |
| 1st Author's Affiliation | Tohoku University (Tohoku Univ) |
| 2nd Author's Name | Takahashi Kentarou |
| 2nd Author's Affiliation | Sumitomo Osaka Cement Co., LTD (Sumitomo Osaka Cement) |
| 3rd Author's Name | Tetsuya Goto |
| 3rd Author's Affiliation | Tohoku University (Tohoku Univ) |
| 4th Author's Name | Shigetoshi Sugawa |
| 4th Author's Affiliation | Tohoku University (Tohoku Univ) |
| 5th Author's Name | Tadahiro Ohmi |
| 5th Author's Affiliation | Tohoku University (Tohoku Univ) |
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| Speaker | Author-1 |
| Date Time | 2015-10-30 14:30:00 |
| Presentation Time | 30 minutes |
| Registration for | SDM |
| Paper # | SDM2015-81 |
| Volume (vol) | vol.115 |
| Number (no) | no.280 |
| Page | pp.53-56 |
| #Pages | 4 |
| Date of Issue | 2015-10-22 (SDM) |
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