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Paper Abstract and Keywords
Presentation 2015-10-30 14:30
Low Work Function LaB6 Thin Films Prepared by Nitrogen Doped LaB6 Target Sputtering
Hidekazu Ishii (Tohoku Univ), Takahashi Kentarou (Sumitomo Osaka Cement), Tetsuya Goto, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ) SDM2015-81 Link to ES Tech. Rep. Archives: SDM2015-81
Abstract (in Japanese) (See Japanese page) 
(in English) LaB6 thin films were deposited by magnetron sputtering, and their work function was investigated. It was found that the work function depends greatly on the nitrogen and the oxygen concentrations in the LaB6 sputtering target. Low work function of 2.4 eV was obtained when the nitrogen concentration was approximately 0.4% and the oxygen concentration was controlled below 1%. In this condition, the Hall measurement results revealed that the sputtered LaB6 film exhibited both the highest electron mobility (1.5 cm2/Vs) and the highest electron density (3.3×1022 cm-3). This suggested that orderliness between atoms was improved at this condition, resulting in the realization of low work function.
Keyword (in Japanese) (See Japanese page) 
(in English) LaB6 / Sputtering deposition / Work Function / Lanthanum Hexaboride / / / /  
Reference Info. IEICE Tech. Rep., vol. 115, no. 280, SDM2015-81, pp. 53-56, Oct. 2015.
Paper # SDM2015-81 
Date of Issue 2015-10-22 (SDM) 
ISSN Print edition: ISSN 0913-5685  Online edition: ISSN 2432-6380
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee SDM  
Conference Date 2015-10-29 - 2015-10-30 
Place (in Japanese) (See Japanese page) 
Place (in English) Niche, Tohoku Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process Science and New Process Technology 
Paper Information
Registration To SDM 
Conference Code 2015-10-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Low Work Function LaB6 Thin Films Prepared by Nitrogen Doped LaB6 Target Sputtering 
Sub Title (in English)  
Keyword(1) LaB6  
Keyword(2) Sputtering deposition  
Keyword(3) Work Function  
Keyword(4) Lanthanum Hexaboride  
1st Author's Name Hidekazu Ishii  
1st Author's Affiliation Tohoku University (Tohoku Univ)
2nd Author's Name Takahashi Kentarou  
2nd Author's Affiliation Sumitomo Osaka Cement Co., LTD (Sumitomo Osaka Cement)
3rd Author's Name Tetsuya Goto  
3rd Author's Affiliation Tohoku University (Tohoku Univ)
4th Author's Name Shigetoshi Sugawa  
4th Author's Affiliation Tohoku University (Tohoku Univ)
5th Author's Name Tadahiro Ohmi  
5th Author's Affiliation Tohoku University (Tohoku Univ)
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Date Time 2015-10-30 14:30:00 
Presentation Time 30 
Registration for SDM 
Paper # IEICE-SDM2015-81 
Volume (vol) IEICE-115 
Number (no) no.280 
Page pp.53-56 
#Pages IEICE-4 
Date of Issue IEICE-SDM-2015-10-22 

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