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Paper Abstract and Keywords
Presentation 2015-08-27 11:00
Highly reliable a-InGaZnO thin-film transistors with fluorine in a gate insulator
Haruka Yamazaki, Yasuaki Ishikawa, Mami Fujii, Juan Paolo Bermundo (NAIST), Eiji Takahashi, Yasunori Andoh (Nissin Electric), Yukiharu Uraoka (NAIST) R2015-24 EMD2015-32 CPM2015-48 OPE2015-63 LQE2015-32 Link to ES Tech. Rep. Archives: EMD2015-32 CPM2015-48 OPE2015-63 LQE2015-32
Abstract (in Japanese) (See Japanese page) 
(in English) Considerable attention has been paid to amorphous indium-gallium-zinc oxide (a-IGZO) thin-film transistors (TFTs) as peripheral circuits for displays. However, achieving highly reliable a-IGZO TFTs continues to be a serious challenge. We propose a-IGZO TFTs with a fluorinated silicon nitride (SiNx:F) gate insulator (GI) which showed good reliability against positive bias temperature stress (PBTS) compared with those with thermally oxidized SiO2 GIs. From the result of X-ray photoelectron spectroscopy analysis, the fluorine in SiNx:F formed a bonding state with indium at the interface between SiNx:F and a-IGZO. Here we report a reliability-improvement mechanism using SiNx:F GIs.
Keyword (in Japanese) (See Japanese page) 
(in English) thin-film transistor / a-IGZO / gate insulator / reliability / fluorine / / /  
Reference Info. IEICE Tech. Rep., vol. 115, no. 194, R2015-24, pp. 9-11, Aug. 2015.
Paper # R2015-24 
Date of Issue 2015-08-20 (R, EMD, CPM, OPE, LQE) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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Download PDF R2015-24 EMD2015-32 CPM2015-48 OPE2015-63 LQE2015-32 Link to ES Tech. Rep. Archives: EMD2015-32 CPM2015-48 OPE2015-63 LQE2015-32

Conference Information
Committee CPM OPE LQE R EMD  
Conference Date 2015-08-27 - 2015-08-28 
Place (in Japanese) (See Japanese page) 
Place (in English) Aomori-Bussankan-Asupamu 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To R 
Conference Code 2015-08-CPM-OPE-LQE-R-EMD 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Highly reliable a-InGaZnO thin-film transistors with fluorine in a gate insulator 
Sub Title (in English)  
Keyword(1) thin-film transistor  
Keyword(2) a-IGZO  
Keyword(3) gate insulator  
Keyword(4) reliability  
Keyword(5) fluorine  
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Keyword(8)  
1st Author's Name Haruka Yamazaki  
1st Author's Affiliation Nara institute of science and technology (NAIST)
2nd Author's Name Yasuaki Ishikawa  
2nd Author's Affiliation Nara institute of science and technology (NAIST)
3rd Author's Name Mami Fujii  
3rd Author's Affiliation Nara institute of science and technology (NAIST)
4th Author's Name Juan Paolo Bermundo  
4th Author's Affiliation Nara institute of science and technology (NAIST)
5th Author's Name Eiji Takahashi  
5th Author's Affiliation Nissin Electric Co.,Ltd (Nissin Electric)
6th Author's Name Yasunori Andoh  
6th Author's Affiliation Nissin Electric Co.,Ltd (Nissin Electric)
7th Author's Name Yukiharu Uraoka  
7th Author's Affiliation Nara institute of science and technology (NAIST)
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Speaker Author-1 
Date Time 2015-08-27 11:00:00 
Presentation Time 25 minutes 
Registration for R 
Paper # R2015-24, EMD2015-32, CPM2015-48, OPE2015-63, LQE2015-32 
Volume (vol) vol.115 
Number (no) no.194(R), no.195(EMD), no.196(CPM), no.197(OPE), no.198(LQE) 
Page pp.9-11 
#Pages
Date of Issue 2015-08-20 (R, EMD, CPM, OPE, LQE) 


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