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Paper Abstract and Keywords
Presentation 2015-07-24 14:05
Low Damage Dry Etching for Recessed Gate AlGaN/GaN-HEMTs
Yuichi Minoura, Naoya Okamoto, Toshihiro Ohki, Shiro Ozaki, Kozo Makiyama, Yoichi Kamada, Keiji Watanabe (Fujitsu Labs.) ED2015-38 Link to ES Tech. Rep. Archives: ED2015-38
Abstract (in Japanese) (See Japanese page) 
(in English) (Not available yet)
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(in English) / / / / / / /  
Reference Info. IEICE Tech. Rep., vol. 115, no. 156, ED2015-38, pp. 9-13, July 2015.
Paper # ED2015-38 
Date of Issue 2015-07-17 (ED) 
ISSN Print edition: ISSN 0913-5685  Online edition: ISSN 2432-6380
Copyright
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reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2015-38 Link to ES Tech. Rep. Archives: ED2015-38

Conference Information
Committee ED  
Conference Date 2015-07-24 - 2015-07-25 
Place (in Japanese) (See Japanese page) 
Place (in English) IT Business Plaza Musashi 5F 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Semiconductor Processes and Devices 
Paper Information
Registration To ED 
Conference Code 2015-07-ED 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Low Damage Dry Etching for Recessed Gate AlGaN/GaN-HEMTs 
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1st Author's Name Yuichi Minoura  
1st Author's Affiliation Fujitsu Laboratories Ltd. (Fujitsu Labs.)
2nd Author's Name Naoya Okamoto  
2nd Author's Affiliation Fujitsu Laboratories Ltd. (Fujitsu Labs.)
3rd Author's Name Toshihiro Ohki  
3rd Author's Affiliation Fujitsu Laboratories Ltd. (Fujitsu Labs.)
4th Author's Name Shiro Ozaki  
4th Author's Affiliation Fujitsu Laboratories Ltd. (Fujitsu Labs.)
5th Author's Name Kozo Makiyama  
5th Author's Affiliation Fujitsu Laboratories Ltd. (Fujitsu Labs.)
6th Author's Name Yoichi Kamada  
6th Author's Affiliation Fujitsu Laboratories Ltd. (Fujitsu Labs.)
7th Author's Name Keiji Watanabe  
7th Author's Affiliation Fujitsu Laboratories Ltd. (Fujitsu Labs.)
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Speaker
Date Time 2015-07-24 14:05:00 
Presentation Time 25 
Registration for ED 
Paper # IEICE-ED2015-38 
Volume (vol) IEICE-115 
Number (no) no.156 
Page pp.9-13 
#Pages IEICE-5 
Date of Issue IEICE-ED-2015-07-17 


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