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Paper Abstract and Keywords
Presentation 2015-05-29 11:45
Sulfur annealing of electrochemically deposited iron sulfide thin films and application to heterojunction cells with ZnO
Takahiro Kajima (Nagoya Inst. of Tech.), Shoichi Kawai (DENSO CORP.), Masaya Ichimura (Nagoya Inst. of Tech.) ED2015-34 CPM2015-19 SDM2015-36 Link to ES Tech. Rep. Archives: ED2015-34 CPM2015-19 SDM2015-36
Abstract (in Japanese) (See Japanese page) 
(in English) The electrochemical deposition (ECD) is a method to deposit thin films by reducing ions in an aqueous solution. FeS2 (pyrite) is a semiconductor which consist of abundant and nontoxic elements and has high optical absorption coefficient. In this research, iron sulfide thin films were deposited by ECD and annealed with sulfur powder. By annealing at 400℃, we confirmed decrease of oxygen ratio and crystallization of iron pyrite. Then, we fabricated heterojunction cells using iron sulfide and ZnO thin films and confirmed rectification, but the leakage current was increased and the forward current was decreased by the annealing.
Keyword (in Japanese) (See Japanese page) 
(in English) Electrochemical deposition / FeS2 / pyrite / Solar cell / / / /  
Reference Info. IEICE Tech. Rep., vol. 115, no. 63, ED2015-34, pp. 91-95, May 2015.
Paper # ED2015-34 
Date of Issue 2015-05-21 (ED, CPM, SDM) 
ISSN Print edition: ISSN 0913-5685  Online edition: ISSN 2432-6380
Copyright
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reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (No. 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2015-34 CPM2015-19 SDM2015-36 Link to ES Tech. Rep. Archives: ED2015-34 CPM2015-19 SDM2015-36

Conference Information
Committee ED CPM SDM  
Conference Date 2015-05-28 - 2015-05-29 
Place (in Japanese) (See Japanese page) 
Place (in English) Venture Business Laboratory, Toyohashi University of Technology 
Topics (in Japanese) (See Japanese page) 
Topics (in English) crystal growth、devices characterization , etc. 
Paper Information
Registration To ED 
Conference Code 2015-05-ED-CPM-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Sulfur annealing of electrochemically deposited iron sulfide thin films and application to heterojunction cells with ZnO 
Sub Title (in English)  
Keyword(1) Electrochemical deposition  
Keyword(2) FeS2  
Keyword(3) pyrite  
Keyword(4) Solar cell  
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1st Author's Name Takahiro Kajima  
1st Author's Affiliation Nagoya Institute of Technology (Nagoya Inst. of Tech.)
2nd Author's Name Shoichi Kawai  
2nd Author's Affiliation DENSO Corporation (DENSO CORP.)
3rd Author's Name Masaya Ichimura  
3rd Author's Affiliation Nagoya Institute of Technology (Nagoya Inst. of Tech.)
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Speaker
Date Time 2015-05-29 11:45:00 
Presentation Time 25 
Registration for ED 
Paper # IEICE-ED2015-34,IEICE-CPM2015-19,IEICE-SDM2015-36 
Volume (vol) IEICE-115 
Number (no) no.63(ED), no.64(CPM), no.65(SDM) 
Page pp.91-95 
#Pages IEICE-5 
Date of Issue IEICE-ED-2015-05-21,IEICE-CPM-2015-05-21,IEICE-SDM-2015-05-21 


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