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Paper Abstract and Keywords
Presentation 2015-03-02 13:00
A Fast Lithographic Mask Correction Algorithm
Ahmd Awad, Atsushi Takahashi (Tokyo Institute of Technology) VLD2014-153
Abstract (in Japanese) (See Japanese page) 
(in English) As technology nodes downscaling into sub-16 nm regime, the industry relies heavily on Optical Proximity
Correction (OPC) to improve mask pattern transfer fidelity and process window for optical micro-lithography. However, OPC
computational time becomes a crucial factor since mask data have to be prepared in manner of hours to cover
the huge industrial needs. Nevertheless, there is a trade-off between mask image accuracy and OPC simulation
time. In this paper, we propose a new grid based algorithm to improve the accuracy of simulated mask image with the least
number of convolutions during OPC process, which is proportional to OPC computational time. We analyze our algorithm and the observations we obtained on
public benchmark released by IBM for ICCAD 2013 CAD contest.
Keyword (in Japanese) (See Japanese page) 
(in English) Optical Lithography / Grids / / Mask / Intensity Difference Map / OPC / /  
Reference Info. IEICE Tech. Rep., vol. 114, no. 476, VLD2014-153, pp. 1-6, March 2015.
Paper # VLD2014-153 
Date of Issue 2015-02-23 (VLD) 
ISSN Print edition: ISSN 0913-5685  Online edition: ISSN 2432-6380
Copyright
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee VLD  
Conference Date 2015-03-02 - 2015-03-04 
Place (in Japanese) (See Japanese page) 
Place (in English) Okinawa Seinen Kaikan 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To VLD 
Conference Code 2015-03-VLD 
Language English 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) A Fast Lithographic Mask Correction Algorithm 
Sub Title (in English)  
Keyword(1) Optical Lithography  
Keyword(2) Grids  
Keyword(3)  
Keyword(4) Mask  
Keyword(5) Intensity Difference Map  
Keyword(6) OPC  
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Keyword(8)  
1st Author's Name Ahmd Awad  
1st Author's Affiliation Tokyo Institute of Technology (Tokyo Institute of Technology)
2nd Author's Name Atsushi Takahashi  
2nd Author's Affiliation Tokyo Institute of Technology (Tokyo Institute of Technology)
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Speaker
Date Time 2015-03-02 13:00:00 
Presentation Time 25 
Registration for VLD 
Paper # IEICE-VLD2014-153 
Volume (vol) IEICE-114 
Number (no) no.476 
Page pp.1-6 
#Pages IEICE-6 
Date of Issue IEICE-VLD-2015-02-23 


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