講演抄録/キーワード |
講演名 |
2015-03-02 13:00
A Fast Lithographic Mask Correction Algorithm ○Ahmd Awad・Atsushi Takahashi(Tokyo Institute of Technology) VLD2014-153 |
抄録 |
(和) |
As technology nodes downscaling into sub-16 nm regime, the industry relies heavily on Optical Proximity
Correction (OPC) to improve mask pattern transfer fidelity and process window for optical micro-lithography. However, OPC
computational time becomes a crucial factor since mask data have to be prepared in manner of hours to cover
the huge industrial needs. Nevertheless, there is a trade-off between mask image accuracy and OPC simulation
time. In this paper, we propose a new grid based algorithm to improve the accuracy of simulated mask image with the least
number of convolutions during OPC process, which is proportional to OPC computational time. We analyze our algorithm and the observations we obtained on
public benchmark released by IBM for ICCAD 2013 CAD contest. |
(英) |
As technology nodes downscaling into sub-16 nm regime, the industry relies heavily on Optical Proximity
Correction (OPC) to improve mask pattern transfer fidelity and process window for optical micro-lithography. However, OPC
computational time becomes a crucial factor since mask data have to be prepared in manner of hours to cover
the huge industrial needs. Nevertheless, there is a trade-off between mask image accuracy and OPC simulation
time. In this paper, we propose a new grid based algorithm to improve the accuracy of simulated mask image with the least
number of convolutions during OPC process, which is proportional to OPC computational time. We analyze our algorithm and the observations we obtained on
public benchmark released by IBM for ICCAD 2013 CAD contest. |
キーワード |
(和) |
Optical Lithography / Grids / Mask / Intensity Difference Map / OPC / / / |
(英) |
Optical Lithography / Grids / Mask / Intensity Difference Map / OPC / / / |
文献情報 |
信学技報, vol. 114, no. 476, VLD2014-153, pp. 1-6, 2015年3月. |
資料番号 |
VLD2014-153 |
発行日 |
2015-02-23 (VLD) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
著作権に ついて |
技術研究報告に掲載された論文の著作権は電子情報通信学会に帰属します.(許諾番号:10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
PDFダウンロード |
VLD2014-153 |