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Paper Abstract and Keywords
Presentation 2015-03-02 13:25
A cut-pattern reduction method for routing in Self-Aligned Double Patterning
Noriyuki Takahashi, Takeshi Ihara, Atsushi Takahashi (Tokyo Tech) VLD2014-154
Abstract (in Japanese) (See Japanese page) 
(in English) In Self-Aligned Double Patterning (SADP),
a routing method that generates a SADP friendly routing pattern efficiently
by using two-color base grid was proposed.
A routing pattern can be realized without trim mask
if a special pattern called cut-pattern is used in a pattern mask of SADP.
However the reliability of a wafer image is expected to be reduced
if the number of cut-patterns used increases.
In this paper, we propose a routing method that realizes
a routing pattern with less cut-patterns
by using two-color base grid.
Keyword (in Japanese) (See Japanese page) 
(in English) SADP / Two-color base grid / Mask / Cut-Pattern / / / /  
Reference Info. IEICE Tech. Rep., vol. 114, no. 476, VLD2014-154, pp. 7-12, March 2015.
Paper # VLD2014-154 
Date of Issue 2015-02-23 (VLD) 
ISSN Print edition: ISSN 0913-5685  Online edition: ISSN 2432-6380
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee VLD  
Conference Date 2015-03-02 - 2015-03-04 
Place (in Japanese) (See Japanese page) 
Place (in English) Okinawa Seinen Kaikan 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To VLD 
Conference Code 2015-03-VLD 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) A cut-pattern reduction method for routing in Self-Aligned Double Patterning 
Sub Title (in English)  
Keyword(1) SADP  
Keyword(2) Two-color base grid  
Keyword(3) Mask  
Keyword(4) Cut-Pattern  
1st Author's Name Noriyuki Takahashi  
1st Author's Affiliation Tokyo Institute of Technology (Tokyo Tech)
2nd Author's Name Takeshi Ihara  
2nd Author's Affiliation Tokyo Institute of Technology (Tokyo Tech)
3rd Author's Name Atsushi Takahashi  
3rd Author's Affiliation Tokyo Institute of Technology (Tokyo Tech)
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Date Time 2015-03-02 13:25:00 
Presentation Time 25 
Registration for VLD 
Paper # IEICE-VLD2014-154 
Volume (vol) IEICE-114 
Number (no) no.476 
Page pp.7-12 
#Pages IEICE-6 
Date of Issue IEICE-VLD-2015-02-23 

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