Paper Abstract and Keywords |
Presentation |
2015-01-27 16:20
[Invited Talk]
Scaling Breakthrough for Analog/Digital Circuits by Suppressing Variability and Low-Frequency Noise for FinFETs by Amorphous Metal Gate Technology Takashi Matsukawa, Koichi Fukuda, Yongxun Liu, Junichi Tsukada, Hiromi Yamauchi, Yuki Ishikawa, Kazuhiko Endo, Shinichi O'uchi, Shinji Migita, Wataru Mizubayashi, Yukinori Morita, Hiroyuki Ota, Meishoku Masahara (AIST) SDM2014-145 Link to ES Tech. Rep. Archives: SDM2014-145 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
(Not available yet) |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
/ / / / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 114, no. 421, SDM2014-145, pp. 41-44, Jan. 2015. |
Paper # |
SDM2014-145 |
Date of Issue |
2015-01-20 (SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Download PDF |
SDM2014-145 Link to ES Tech. Rep. Archives: SDM2014-145 |