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Paper Abstract and Keywords
Presentation 2014-03-04 15:05
Exposure source optimization by clustering for lithography
Masashi Tawada, Masao Yanagisawa, Nozomu Togawa (Waseda Univ.), Takaki Hashimoto, Keishi Sakanushi, Shigeki Nojima, Toshiya Kotani (Toshiba) VLD2013-152
Abstract (in Japanese) (See Japanese page) 
(in English) In lithography, we generate patterns on a wafer through a photomask,
where patterns generated have to be close to ideal patterns by
optimizing a photomask as well as an exposure source. One of the most
important tasks here is to speed-up exposure source optimization to
have overall optimized photomask and exposure source.
In this paper, we propose a speeding-up method for exposure source
optimization by clustering for lithography.
In our method, we cluster several source grid-points utilizing the lithography property and reduce the
number of parameters to be optimized simultaneously.
Experimental results demonstrate that our method achieves 8X speed-up compared with
a conventional method.
Keyword (in Japanese) (See Japanese page) 
(in English) lithography / source optimization / clustering / / / / /  
Reference Info. IEICE Tech. Rep., vol. 113, no. 454, VLD2013-152, pp. 105-110, March 2014.
Paper # VLD2013-152 
Date of Issue 2014-02-24 (VLD) 
ISSN Print edition: ISSN 0913-5685  Online edition: ISSN 2432-6380
Copyright
and
reproduction
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee VLD  
Conference Date 2014-03-03 - 2014-03-05 
Place (in Japanese) (See Japanese page) 
Place (in English) Okinawa Seinen Kaikan 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Design Technology for System-on-Silicon 
Paper Information
Registration To VLD 
Conference Code 2014-03-VLD 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Exposure source optimization by clustering for lithography 
Sub Title (in English)  
Keyword(1) lithography  
Keyword(2) source optimization  
Keyword(3) clustering  
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1st Author's Name Masashi Tawada  
1st Author's Affiliation Waseda University (Waseda Univ.)
2nd Author's Name Masao Yanagisawa  
2nd Author's Affiliation Waseda University (Waseda Univ.)
3rd Author's Name Nozomu Togawa  
3rd Author's Affiliation Waseda University (Waseda Univ.)
4th Author's Name Takaki Hashimoto  
4th Author's Affiliation Toshiba Corporation (Toshiba)
5th Author's Name Keishi Sakanushi  
5th Author's Affiliation Toshiba Corporation (Toshiba)
6th Author's Name Shigeki Nojima  
6th Author's Affiliation Toshiba Corporation (Toshiba)
7th Author's Name Toshiya Kotani  
7th Author's Affiliation Toshiba Corporation (Toshiba)
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Speaker
Date Time 2014-03-04 15:05:00 
Presentation Time 25 
Registration for VLD 
Paper # IEICE-VLD2013-152 
Volume (vol) IEICE-113 
Number (no) no.454 
Page pp.105-110 
#Pages IEICE-6 
Date of Issue IEICE-VLD-2014-02-24 


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