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| Presentation | 2014-03-04 15:05 Exposure source optimization by clustering for lithography Masashi Tawada, Masao Yanagisawa, Nozomu Togawa (Waseda Univ.), Takaki Hashimoto, Keishi Sakanushi, Shigeki Nojima, Toshiya Kotani (Toshiba)  VLD2013-152 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | In lithography, we generate patterns on a wafer through a photomask, where patterns generated have to be close to ideal patterns by optimizing a photomask as well as an exposure source. One of the most important tasks here is to speed-up exposure source optimization to have overall optimized photomask and exposure source. In this paper, we propose a speeding-up method for exposure source optimization by clustering for lithography. In our method, we cluster several source grid-points utilizing the lithography property and reduce the number of parameters to be optimized simultaneously. Experimental results demonstrate that our method achieves 8X speed-up compared with a conventional method. |
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| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | lithography / source optimization / clustering / / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 113, no. 454, VLD2013-152, pp. 105-110, March 2014. | |
| Paper # | VLD2013-152 | |
| Date of Issue | 2014-02-24 (VLD) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | VLD2013-152 |
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| Conference Information | |
| Committee | VLD |
| Conference Date | 2014-03-03 - 2014-03-05 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Okinawa Seinen Kaikan |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Technology for System-on-Silicon |
| Paper Information | |
| Registration To | VLD |
| Conference Code | 2014-03-VLD |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Exposure source optimization by clustering for lithography |
| Sub Title (in English) | |
| Keyword(1) | lithography |
| Keyword(2) | source optimization |
| Keyword(3) | clustering |
| Keyword(4) | |
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| 1st Author's Name | Masashi Tawada |
| 1st Author's Affiliation | Waseda University (Waseda Univ.) |
| 2nd Author's Name | Masao Yanagisawa |
| 2nd Author's Affiliation | Waseda University (Waseda Univ.) |
| 3rd Author's Name | Nozomu Togawa |
| 3rd Author's Affiliation | Waseda University (Waseda Univ.) |
| 4th Author's Name | Takaki Hashimoto |
| 4th Author's Affiliation | Toshiba Corporation (Toshiba) |
| 5th Author's Name | Keishi Sakanushi |
| 5th Author's Affiliation | Toshiba Corporation (Toshiba) |
| 6th Author's Name | Shigeki Nojima |
| 6th Author's Affiliation | Toshiba Corporation (Toshiba) |
| 7th Author's Name | Toshiya Kotani |
| 7th Author's Affiliation | Toshiba Corporation (Toshiba) |
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| Speaker | Author-1 |
| Date Time | 2014-03-04 15:05:00 |
| Presentation Time | 25 minutes |
| Registration for | VLD |
| Paper # | VLD2013-152 |
| Volume (vol) | vol.113 |
| Number (no) | no.454 |
| Page | pp.105-110 |
| #Pages | 6 |
| Date of Issue | 2014-02-24 (VLD) |
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