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| Presentation | 2014-03-04 14:10 On-wafer de-embedding pattern design for reduced uncertainty under an area constraint Masafumi Suizu, Akihiko Orii, Kyoya Takano, Mizuki Motoyoshi, Kosuke Katayama, Takeshi Yoshida, Shuhei Amakawa, Minoru Fujishima (Hiroshima Univ.)  MW2013-203 Link to ES Tech. Rep. Archives: MW2013-203 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | To obtain the characteristics of the individual devices in the high-frequency measurement, de-embedding is required to remove the influence of the pads from the measurement results. For more accurate extraction of parameters, it is necessary to consider the uncertainty of the on-wafer de-embedding. We propose a method for designing the layout of on-wafer de-embedding patterns for multiline TRL with minimal uncertainty in de-embedding under a chip area constraint. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | On-wafer de-embedding / Uncertainty / / / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 113, no. 460, MW2013-203, pp. 35-40, March 2014. | |
| Paper # | MW2013-203 | |
| Date of Issue | 2014-02-25 (MW) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | MW2013-203 Link to ES Tech. Rep. Archives: MW2013-203 |
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| Conference Information | |
| Committee | MW |
| Conference Date | 2014-03-04 - 2014-03-05 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Ehime University |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Microwave Technologies |
| Paper Information | |
| Registration To | MW |
| Conference Code | 2014-03-MW |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | On-wafer de-embedding pattern design for reduced uncertainty under an area constraint |
| Sub Title (in English) | |
| Keyword(1) | On-wafer de-embedding |
| Keyword(2) | Uncertainty |
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| Keyword(8) | |
| 1st Author's Name | Masafumi Suizu |
| 1st Author's Affiliation | Hiroshima University (Hiroshima Univ.) |
| 2nd Author's Name | Akihiko Orii |
| 2nd Author's Affiliation | Hiroshima University (Hiroshima Univ.) |
| 3rd Author's Name | Kyoya Takano |
| 3rd Author's Affiliation | Hiroshima University (Hiroshima Univ.) |
| 4th Author's Name | Mizuki Motoyoshi |
| 4th Author's Affiliation | Hiroshima University (Hiroshima Univ.) |
| 5th Author's Name | Kosuke Katayama |
| 5th Author's Affiliation | Hiroshima University (Hiroshima Univ.) |
| 6th Author's Name | Takeshi Yoshida |
| 6th Author's Affiliation | Hiroshima University (Hiroshima Univ.) |
| 7th Author's Name | Shuhei Amakawa |
| 7th Author's Affiliation | Hiroshima University (Hiroshima Univ.) |
| 8th Author's Name | Minoru Fujishima |
| 8th Author's Affiliation | Hiroshima University (Hiroshima Univ.) |
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| Speaker | Author-1 |
| Date Time | 2014-03-04 14:10:00 |
| Presentation Time | 25 minutes |
| Registration for | MW |
| Paper # | MW2013-203 |
| Volume (vol) | vol.113 |
| Number (no) | no.460 |
| Page | pp.35-40 |
| #Pages | 6 |
| Date of Issue | 2014-02-25 (MW) |
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